A Rigorous Model for Through-Silicon Vias with Ohmic Contact in Silicon Interposer

De-Cao Yang,Jianyong Xie,Madhavan Swaminathan,Xing-Chang Wei,Er-Ping Li
DOI: https://doi.org/10.1109/lmwc.2013.2270459
IF: 3
2013-01-01
IEEE Microwave and Wireless Components Letters
Abstract:High-density through-silicon via (TSV) interconnects in silicon interposer require effective crosstalk-reduction signaling schemes and rigorous crosstalk modeling techniques. In this letter, we propose a rigorous model for grounded TSVs with ohmic contact. The proposed model takes into account contact resistance, doping density, and doping-region capacitance for the metal-silicon interface of grounded TSVs. The comparison between modeling results and full-wave simulations validates the accuracy of the proposed model for signal-ground-signal vias.
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