PDN Impedance Modeling for Multiple Through Vias Array in Doped Silicon

Guang-Xiao Luo,Er-Ping Li,Xing-Chang Wei,Xiang Cui,Ran Hao
DOI: https://doi.org/10.1109/temc.2014.2312356
IF: 2.036
2014-01-01
IEEE Transactions on Electromagnetic Compatibility
Abstract:The power distribution network (PDN) impedance of 3-D-through silicon vias (TSVs) interposer layer is modeled by considering the metal-oxide-semiconductor (MOS) structure effects. The Lambert W function is proposed to simulate the change of depletion width with the bias voltage in the static field, and the high-frequency MOS capacitance is obtained while considering the charges at the semiconductor-insulator interface. Furthermore, based on the depletion width and the insulating dielectric layer assumption, the electrical model of power-ground TSVs pair is presented by combining the MOS capacitance with TSVs parasitic RLGC (resistance-inductance-capacitance-conductance). Finally, the PDN impedance characteristics of the 3-D-IC integrated system with multiple TSVs are performed by using the proposed multitransmission line and model reduction methods, and the importance of the capacitance is presented.
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