Abstract:High quality (Q) factor microdisks are fundamental building blocks of on-chip integrated photonic circuits and biological sensors. The resonant modes in microdisks circulate near their boundaries, making their performances strongly dependent upon surface roughness. Surface-tension-induced microspheres and microtoroids are superior to other dielectric microdisks when comparing Q factors. However, most photonic materials such as silicon and negative photoresists are hard to be reflowed and thus the realizations of high-Q microdisks are strongly dependent on electron-beam lithography. Herein, we demonstrate a robust, cost-effective, and highly reproducible technique to fabricate ultrahigh-Q microdisks. By using silica microtoroids as masks, we have successfully replicated their ultrasmooth boundaries in a photoresist via anisotropic dry etching. The experimentally recorded Q factors of passive microdisks can be as large as 1.5 × 106. Similarly, ultrahigh Q microdisk lasers have also been replicated in dye-doped polymeric films. The laser linewidth is only 8 pm, which is limited by the spectrometer and is much narrower than that in previous reports. Meanwhile, high-Q deformed microdisks have also been fabricated by controlling the shape of microtoroids, making the internal ray dynamics and external directional laser emissions controllable. Interestingly, this technique also applies to other materials. Silicon microdisks with Q > 106 have been experimentally demonstrated with a similar process. We believe this research will be important for the advances of high-Q micro-resonators and their applications.

A Novel Method to Fabricate On-Chip Ultra-High-q Microtoroid Resonators

Fabrication of Microresonators of High Q/V Ratios Using Femtosecond Laser Micromachining

Fabrication of high-Q microresonators in dielectric materials using a femtosecond laser: Principle and applications

Broadband Highly Efficient Nonlinear Optical Processes in On-Chip Integrated Lithium Niobate Microdisk Resonators of Q-factor above 108

Femtosecond Laser Direct Writing of High-Q Microresonators in Glass and Crystals

Methods to Achieve Ultra-High Quality Factor Silicon Nitride Resonators

High-quality-factor Optical Microresonators Fabricated on Lithium Niobate Thin Film with an Electro-Optical Tuning Range Spanning over One Free Spectral Range [Invited]

Fabrication of a microtoroidal resonator with picometer precise resonant wavelength.

Single-Mode Silicon-On-Insulator Elliptical Microdisk Resonators with High Q Factors

Fabrication and characterization of on-chip silicon spherical-like microcavities with high Q-factors

Dry-etched Ultrahigh-Q Silica Microdisk Resonators on a Silicon Chip

High-Q Silica Microdisk Optical Resonators with Large Wedge Angles on a Silicon Chip

Improved HNA Isotropic Etching for Large-Scale Highly Symmetric Toroidal Silicon Molds with < 10-Nm Roughness

High-Q whispering gallery mode directly on a silicon substrate

High-Q and highly reproducible microdisks and microlasers.

Nanofabrication of High-Q Thin Film Lithium Niobate Microrings Using Wet Etching

Ultrahigh-Q crystalline microresonator fabrication with only precision machining

Fabrication of Microresonators by Using Photoresist Developer As Etchant*

Greater Than One Billion Q Factor for On-Chip Microresonators

Fabrication of a microresonator-fiber assembly maintaining a high-quality factor by CO2 laser welding

A Precise Measurement of Quality Factor for Planar Microtoroid Resonators