Abstract:Thin-film lithium niobate (TFLN) has been considered as one of the most important platforms for constructing high-performance photonic integrated devices such as electro-optic modulators, frequency combs, classical/quantum light sources, and large-scale photonic integrated circuits, benefiting from its excellent optical properties of TFLN. The fabrication quality of TFLN photonic integrated devices plays an important role in the performance and the integration scale of these devices. As one of the element photonic structures, the state-of-the-art TFLN microrings reach an intrinsic Q factor higher than 10^7 with ultra-smooth sidewalls, fabricated by photolithography assisted chemo-mechanical etching (PLACE). However, it is isolated on the chip surface and a tapered fiber is required to couple the light into and out of the resonator. Furthermore, it is difficult to maintain such high-Q factors when the microrings are monolithically integrated with bus waveguides by PLACE, resulted from large coupling loss with biggish coupling gap. Here, a relatively narrow gap of an ultra-high Q microring monolithically integrated with the bus-waveguide is achieved with 3.8 um by optimizing PLACE process, and a high temperature annealing is carried out to improve the loaded (intrinsic) Q factor with 4.29 X 10^6 (4.04 X 10^7), leading an ultra-low propagation loss of less than 1 dB/m, which is approximately 3 times better than the best values previously reported in ion-slicing TFLN platform.

High-quality-factor Optical Microresonators Fabricated on Lithium Niobate Thin Film with an Electro-Optical Tuning Range Spanning over One Free Spectral Range [Invited]

On-Chip Electro-Optic Tuning of A Lithium Niobate Microresonator with Integrated In-Plane Microelectrodes

Broadband Highly Efficient Nonlinear Optical Processes in On-Chip Integrated Lithium Niobate Microdisk Resonators of Q-factor above 108

Fabrication of Microresonators of High Q/V Ratios Using Femtosecond Laser Micromachining

Monolithic Integration of a High-Quality Factor Lithium Niobate Microresonator with a Free-Standing Membrane Waveguide Using Femtosecond Laser Assisted Ion Beam Writing (FLAIBW)

Ultrahigh quality-factor microresonators fabricated in pristine lithium niobate thin film for efficient nonlinear optics applications

Monolithic Integration of a Lithium Niobate Microresonator with a Free-Standing Waveguide Using Femtosecond Laser Assisted Ion Beam Writing.

Fabrication of high-Q microresonators in dielectric materials using a femtosecond laser: Principle and applications

Fabrication of High-Q Crystalline Microresonators by Femtosecond Laser Direct Writing for Phase Matched Second Harmonic Generation

Femtosecond Laser Direct Writing of High-Q Microresonators in Glass and Crystals

Electro-optic tuning of a single-frequency ultranarrow linewidth microdisk laser

Strong Nonlinear Optics In On-Chip Coupled Lithium Niobate Microdisk Photonic Molecules

Lithium niobate micro-disk resonators of quality factors above 10^7

Twenty-nine million Intrinsic Q-factor Monolithic Microresonators on Thin Film Lithium Niobate

Fabrication of high-Q lithium niobate microresonators using femtosecond laser micromachining

Twenty-nine million intrinsic Q-factor monolithic microresonators on thin-film lithium niobate

Nanofabrication of High-Q Thin Film Lithium Niobate Microrings Using Wet Etching

Ultra-high Q lithium niobate microring monolithically fabricated by photolithography assisted chemo-mechanical etching

Spectral engineering of optical microresonators in anisotropic lithium niobate crystal

Microresonators in Lithium Niobate Thin Films

Lithium niobate microring with ultra-high Q factor above 10^8