Abstract:Thin-film lithium niobate (TFLN) has been considered as one of the most important platforms for constructing high-performance photonic integrated devices such as electro-optic modulators, frequency combs, classical/quantum light sources, and large-scale photonic integrated circuits, benefiting from its excellent optical properties of TFLN. The fabrication quality of TFLN photonic integrated devices plays an important role in the performance and the integration scale of these devices. As one of the element photonic structures, the state-of-the-art TFLN microrings reach an intrinsic Q factor higher than 10^7 with ultra-smooth sidewalls, fabricated by photolithography assisted chemo-mechanical etching (PLACE). However, it is isolated on the chip surface and a tapered fiber is required to couple the light into and out of the resonator. Furthermore, it is difficult to maintain such high-Q factors when the microrings are monolithically integrated with bus waveguides by PLACE, resulted from large coupling loss with biggish coupling gap. Here, a relatively narrow gap of an ultra-high Q microring monolithically integrated with the bus-waveguide is achieved with 3.8 um by optimizing PLACE process, and a high temperature annealing is carried out to improve the loaded (intrinsic) Q factor with 4.29 X 10^6 (4.04 X 10^7), leading an ultra-low propagation loss of less than 1 dB/m, which is approximately 3 times better than the best values previously reported in ion-slicing TFLN platform.

Fabrication of high-Q lithium niobate microresonators using femtosecond laser micromachining

Fabrication of Microresonators of High Q/V Ratios Using Femtosecond Laser Micromachining

Femtosecond Laser Direct Writing of High-Q Microresonators in Glass and Crystals

Fabrication of high-Q microresonators in dielectric materials using a femtosecond laser: Principle and applications

Monolithic Integration of a Lithium Niobate Microresonator with a Free-Standing Waveguide Using Femtosecond Laser Assisted Ion Beam Writing.

Fabrication of High-Q Crystalline Microresonators by Femtosecond Laser Direct Writing for Phase Matched Second Harmonic Generation

Monolithic Integration of a High-Quality Factor Lithium Niobate Microresonator with a Free-Standing Membrane Waveguide Using Femtosecond Laser Assisted Ion Beam Writing (FLAIBW)

Fabrication of Optical Cavities with Femtosecond Laser Pulses

Broadband Highly Efficient Nonlinear Optical Processes in On-Chip Integrated Lithium Niobate Microdisk Resonators of Q-factor above 108

Highly-efficient second and third harmonic generation in a monocrystalline lithium niobate microresonator.

Low-threshold Whispering-Gallery-mode Microlasers Fabricated in a Nd:glass Substrate by Three-Dimensional Femtosecond Laser Micromachining.

Ultra-high-Q Microcavities Fabricated on Fused Silica Chips by Three-Dimensional Femtosecond Laser Microfabrication

On-Chip Electro-Optic Tuning of A Lithium Niobate Microresonator with Integrated In-Plane Microelectrodes

Integrated Lithium Niobate Microring Resonators Fabricated With 515 nm Femtosecond Laser Ablation

Ultrahigh quality-factor microresonators fabricated in pristine lithium niobate thin film for efficient nonlinear optics applications

High-quality-factor Optical Microresonators Fabricated on Lithium Niobate Thin Film with an Electro-Optical Tuning Range Spanning over One Free Spectral Range [Invited]

Fabrication of high quality factor lithium niobate double-disk using a femtosecond laser

Lithium niobate micro-disk resonators of quality factors above 10^7

Lithium Niobate Whispering Gallery Mode Disk Resonator with High Q Factor

Lithium niobate microring with ultra-high Q factor above 10^8

Ultra-high Q lithium niobate microring monolithically fabricated by photolithography assisted chemo-mechanical etching