Abstract:High quality (Q) factor microdisks are fundamental building blocks of on-chip integrated photonic circuits and biological sensors. The resonant modes in microdisks circulate near their boundaries, making their performances strongly dependent upon surface roughness. Surface-tension-induced microspheres and microtoroids are superior to other dielectric microdisks when comparing Q factors. However, most photonic materials such as silicon and negative photoresists are hard to be reflowed and thus the realizations of high-Q microdisks are strongly dependent on electron-beam lithography. Herein, we demonstrate a robust, cost-effective, and highly reproducible technique to fabricate ultrahigh-Q microdisks. By using silica microtoroids as masks, we have successfully replicated their ultrasmooth boundaries in a photoresist via anisotropic dry etching. The experimentally recorded Q factors of passive microdisks can be as large as 1.5 × 106. Similarly, ultrahigh Q microdisk lasers have also been replicated in dye-doped polymeric films. The laser linewidth is only 8 pm, which is limited by the spectrometer and is much narrower than that in previous reports. Meanwhile, high-Q deformed microdisks have also been fabricated by controlling the shape of microtoroids, making the internal ray dynamics and external directional laser emissions controllable. Interestingly, this technique also applies to other materials. Silicon microdisks with Q > 106 have been experimentally demonstrated with a similar process. We believe this research will be important for the advances of high-Q micro-resonators and their applications.

High-Q and highly reproducible microdisks and microlasers.

Fabrication of high-Q microresonators in dielectric materials using a femtosecond laser: Principle and applications

Chip‐Scale Mass Manufacturable High‐Q Silicon Microdisks

Broadband Highly Efficient Nonlinear Optical Processes in On-Chip Integrated Lithium Niobate Microdisk Resonators of Q-factor above 108

Fabrication of Microresonators of High Q/V Ratios Using Femtosecond Laser Micromachining

Femtosecond Laser Direct Writing of High-Q Microresonators in Glass and Crystals

Fabrication of Optical Cavities with Femtosecond Laser Pulses

Supporting Information High-Q and highly reproducible microdisk and microlasers

Dry-etched Ultrahigh-Q Silica Microdisk Resonators on a Silicon Chip

End-fire Injection of Light into High-Q Silicon Microdisks

High Quality Direct Photo-Patterned Microdisk Lasers with Organic-Inorganic Hybrid Materials

Single-Mode Silicon-On-Insulator Elliptical Microdisk Resonators with High Q Factors

Fabrication of Ultra-High Q Silica Microdisk Using Chemo-Mechanical Polishing

Deformed Microdisk-Based End-Fire Injection and Collection Resonant Device

High-Q Silica Microdisk Optical Resonators with Large Wedge Angles on a Silicon Chip

Laser reflow technology on high-Q toroidal microcavity

All-wet Etched High-Q Optical Microcavity on a Silicon Chip

Lithium Niobate Microdisk Resonators on a Chip (conference Presentation)

Ultrahigh-Q crystalline microresonator fabrication with only precision machining

Whispering-gallery-mode Microdisk Lasers Produced by Femtosecond Laser Direct Writing

Fabrication of three-dimensional microdisk resonators in calcium fluoride by femtosecond laser micromachining