Abstract:High quality (Q) factor microdisks are fundamental building blocks of on-chip integrated photonic circuits and biological sensors. The resonant modes in microdisks circulate near their boundaries, making their performances strongly dependent upon surface roughness. Surface-tension-induced microspheres and microtoroids are superior to other dielectric microdisks when comparing Q factors. However, most photonic materials such as silicon and negative photoresists are hard to be reflowed and thus the realizations of high-Q microdisks are strongly dependent on electron-beam lithography. Herein, we demonstrate a robust, cost-effective, and highly reproducible technique to fabricate ultrahigh-Q microdisks. By using silica microtoroids as masks, we have successfully replicated their ultrasmooth boundaries in a photoresist via anisotropic dry etching. The experimentally recorded Q factors of passive microdisks can be as large as 1.5 × 106. Similarly, ultrahigh Q microdisk lasers have also been replicated in dye-doped polymeric films. The laser linewidth is only 8 pm, which is limited by the spectrometer and is much narrower than that in previous reports. Meanwhile, high-Q deformed microdisks have also been fabricated by controlling the shape of microtoroids, making the internal ray dynamics and external directional laser emissions controllable. Interestingly, this technique also applies to other materials. Silicon microdisks with Q > 106 have been experimentally demonstrated with a similar process. We believe this research will be important for the advances of high-Q micro-resonators and their applications.

Dry-etched Ultrahigh-Q Silica Microdisk Resonators on a Silicon Chip

Ultra-high-Q Microcavities Fabricated on Fused Silica Chips by Three-Dimensional Femtosecond Laser Microfabrication

Femtosecond Laser Direct Writing of High-Q Microresonators in Glass and Crystals

Fabrication of Microresonators of High Q/V Ratios Using Femtosecond Laser Micromachining

Fabrication of high-Q microresonators in dielectric materials using a femtosecond laser: Principle and applications

High-Q Silica Microdisk Optical Resonators with Large Wedge Angles on a Silicon Chip

Broadband Highly Efficient Nonlinear Optical Processes in On-Chip Integrated Lithium Niobate Microdisk Resonators of Q-factor above 108

Fabrication of Optical Cavities with Femtosecond Laser Pulses

Fabrication of High-Q Crystalline Microresonators by Femtosecond Laser Direct Writing for Phase Matched Second Harmonic Generation

Fabrication of SiO 2 Microdisk Optical Resonator

Single-Mode Silicon-On-Insulator Elliptical Microdisk Resonators with High Q Factors

High-Q and highly reproducible microdisks and microlasers.

Fabrication of High Optical Quality Factor Free-Standing As2S3 Microdisk Resonators on a Silicon Chip

Greater Than One Billion Q Factor for On-Chip Microresonators

Raman Lasing in a Silica Microdisk Resonator

Demonstration of High-Q Mid-Infrared Chalcogenide Glass-On-Silicon Resonators

Chip‐Scale Mass Manufacturable High‐Q Silicon Microdisks

Radiation-pressure-driven Mechanical Oscillations in Silica Microdisk Resonators on Chip

Research on Silica Microdisk by Wet-etching

An Ultrahigh-Q Microresonator on 4H-silicon-carbide-on-insulator Platform for Multiple Harmonics, Cascaded Raman Lasing and Kerr Comb Generations

Fabrication of Ultra-High Q Silica Microdisk Using Chemo-Mechanical Polishing