Fabrication of High-Q, High-Confinement 4H-Sic Microring Resonators by Surface Roughness Reduction

Yi Zheng,Minhao Pu,Ailun Yi,Ayman N. Kamel,Martin. R. Henriksen,Asbjorn A. Jorgensen,Xin Ou,Haiyan Ou
DOI: https://doi.org/10.23919/cleo.2019.8750418
2019-01-01
Abstract:We improve the $Q$ of SiC microring resonators with a sub-micron cross-sectional dimension by a factor of six by reducing surface roughness. We achieve a high $Q$ (~73,000) for such a device with anomalous dispersion. © 2019 The Author(s)
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