High quality factor Si 3 N 4 ring resonators achieved by surface roughness reduction

Xingchen Ji,Felippe A. S. Barbosa,Alex Bryant,Jaime Cardenas,Samantha P. Roberts,Michal Lipson
DOI: https://doi.org/10.1364/CLEO_SI.2016.SM2R.3
2016-01-01
Abstract:We demonstrate high-confinement Si 3 N 4 ring resonators with a quality factor of 15.6 million. We show that ultra-high quality factors are achievable by using a process that addresses surface roughness on all interfaces of the waveguides.
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