Fabrication of the High-Q Si 3 N 4 Microresonators for Soliton Microcombs

Shuai Wan,Rui Niu,Jin-Lan Peng,Jin Li,Guang-Can Guo,Chang-Ling Zou,Chun-Hua Dong
DOI: https://doi.org/10.3788/col202220.032201
IF: 2.56
2022-01-01
Chinese Optics Letters
Abstract:The microresonator-based soliton microcomb has shown a promising future in many applications. In this work, we report the fabrication of high quality [Q) Si 3 N 4 microring resonators for soliton microcomb generation. By developing the fabrication process with crack isolation trenches and annealing, we can deposit thick stoichiometric Si 3 N 4 film of 800 nm without cracks in the central area. The highest intrinsic Q of the Si 3 N 4 microring obtained in our experiments is about 6 × 10 6 ,corresponding to a propagation loss as low as 0.058 dBm/cm. With such a high Q film, we fabricate microrings with the anomalous dispersion and demonstrate the generation of soliton microcombs with 100 mW on-chip pump power, with an optical parametric oscillation threshold of only 13.4 mW. Our Si 3 N 4 integrated chip provides an ideal platform for researches and applications of nonlinear photonics and integrated photonics.
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