Study of Fabrication and Etching Processes of PZT Thin Films on Silicon

赵宏锦,刘建设,任天令,刘燕翔,刘理天,李志坚
DOI: https://doi.org/10.3969/j.issn.1004-2474.2001.04.013
2001-01-01
Abstract:Lead-zirconate-titanate (PZT) thin films on silicon were prepared by a Sol-Gel methodIt was shown that the PZT thin films had perfect perovskite ferroelectric structure at annealing temperature of 600 °C by X-ray diffraction analysis (XRD)PZT thin films were chemically etched using HCl/HF solution after typical semiconductor lithographic processThe SEM results indicated that the PZT etching problem was well resolved for the application of PZT thin film devices
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