Abstract:Piezoelectric micro devices based on lead zirconate titanate (PZT) thin film have received considerable attention because of their wide potential in nanotechnology, biosensors and microelectromechanical systems. Thin film cracking, device short-circuiting and substrate surface degrading are commonly encountered problems for PZT micro device fabrication using chemical solution deposition (or CSD) process. These problems often lead to an extreme low yield (< 10%) of fabrication and hinder the integration of piezoelectric components into micro -electromechanical systems. In this work, a new manufacturing, method for PZT micro devices is developed for the first time to avoid all these problems. Unlike other modified PZT sol-gel processes, in our process pyrolysised PZT thin film is patterned by wet etching before (rather than after) the high temperature sintering treatment. This new process can tremendously reduce the cracking of thin film and eradicate the diffusion of PZT to those substrate surfaces without Pt buffer layer. The effectiveness of the process is proved by 1) the 100% fabrication yield of a number of PZT micro cantilevers. bridges and platforms, 2) the complete elimination of contaminated surfaces by PZT diffusion.

Fabrication And Etching Processes Of Silicon-Based Pzt Thin Films

Study of Fabrication and Etching Processes of PZT Thin Films on Silicon

Preparation and Etching of Silicon-Based Piezoelectric Thin Films for Integrated Devices

Preparation of PZT Thick Film by a High Speed Sol-gel Method

Fabrication of (100) Orientated PZT Thin Films for MEMS Applications

Study of silicon-based ferroelectric PZT thin films fabricated by sol-gel method

Growth and Characterization of Lead Zirconate Titanate (PZT) Thin Films

Fabrication of PZT microdevices using a high-yield sol-gel process

Interface and Surface Characterization of Lead Zirconate Titanate Thin Films Grown by Sol–Gel Method

Sol-Gel Process and Properties of Textured Pb(Zr, Ti)O-3 Films on Silicon Wafers

Preparation of Pb(Zr0.52Ti484848)O3 Thin Films on Silicon-on-insulator Substrates by Excimer Laser Deposition Combined with Rapid Thermal Annealing

Study of silicon-based ferroelectric thin films prepared by Sol-Gel method

Preparation of Pb(Zr<sub>0.52</sub>Ti484848)O<sub>3</sub> thin films on silicon-on-insulator substrates by excimer laser deposition combined with rapid thermal annealing

Preparation of Pb(Zr0.52Ti0.48)O3 thin films on silicon-on-insulator substrates by excimer laser deposition combined with rapid thermal annealing

Fabrication and Properties of Silicon-Based PZT Thin Films for MFSFET Applications

Preparation and characterization of Sol-Gel derived PZT bulk ceramics and thin films

Preparation and properties of PLZT thick films on silicon

Preparation of (001)-oriented PZT thick films on silicon wafer by pulsed laser deposition

High Quality PZT Thick Films Using Silicon Mold Technique for MEMS Applications

Electrical Properties of Silicon-based Ferroelectric Thin Films Prepared by Sol-Gel Method

Study on fabrication precision of PZT thin film micro pattern