Study on fabrication precision of PZT thin film micro pattern

Qin Liu,Yinyin Lin,Xiaoqing Wu,Lianying Zhang,Xi Yao
1998-01-01
Abstract:PZT (52/48) thin film was etched with BHF/HNO3 solution by using typical semiconductor lithographic process. The effect of microstructure of PZT thin film on the precision of micropattern fabrication was studied. It was found that there is a difference between the etching rates of the islands of grains and surrounding areas within the film. The film with small grains is advantageous to the high fidelity pattern transfer from mask to film. The dimension of the islands of grains determine the error of pattern transfer.
What problem does this paper attempt to address?