Fabrication And Characteristics Of A Si Multiple-Quantum Dots Single Electron Transistor On Simox Substrate

gang lu,jiannong wang,weikun ge,shengchun mao,zhiming chen
DOI: https://doi.org/10.1109/ICSICT.2001.982166
2001-01-01
Abstract:We report silicon-based multiple-quantum dots single electron transistors (SETs) on p-type SIMOX substrates, based on electron beam (EB) lithography and reactive ion etching (RIE) processes. These processes offer controlled fabrication of the quantum wires (QWs) and quantum dots (QDs). Coulomb blockade and single electron tunneling are observed in the SETs.
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