Si/SiGe quantum dot with superconducting single-electron transistor charge sensor

Mingyun Yuan,Feng Pan,Zhen Yang,T. J. Gilheart,Fei Chen,D. E. Savage,M. G. Lagally,M. A. Eriksson,A. J. Rimberg
DOI: https://doi.org/10.1063/1.3572033
IF: 4
2011-04-04
Applied Physics Letters
Abstract:We report a robust process for fabrication of surface-gated Si/SiGe quantum dots (QDs) with an integrated superconducting single-electron transistor (SSET) charge sensor. A combination of a deep mesa etch and AlOx backfill is used to reduce gate leakage. After the leakage current is suppressed, Coulomb oscillations of the QD and the current-voltage characteristics of the SSET are observed at a temperature of 0.3 K. Coupling of the SSET to the QD is confirmed by using the SSET to perform sensing of the QD charge state.
physics, applied
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