Abstract:Solid-state nanopores with feature sizes around 5 nm play a critical role in bio-sensing fields, especially in single molecule detection and sequencing of DNA, RNA and proteins. In this paper we present a systematic study on shrinkage and site-selective modification of single-crystal silicon nanopores with a conventional scanning electron microscope (SEM). Square nanopores with measurable sizes as small as 8 nm × 8 nm and rectangle nanopores with feature sizes (the smaller one between length and width) down to 5 nm have been obtained, using the SEM-induced shrinkage technique. The analysis of energy dispersive x-ray spectroscopy and the recovery of the pore size and morphology reveal that the grown material along with the edge of the nanopore is the result of deposition of hydrocarbon compounds, without structural damage during the shrinking process. A simplified model for pore shrinkage has been developed based on observation of the cross-sectional morphology of the shrunk nanopore. The main factors impacting on the task of controllably shrinking the nanopores, such as the accelerating voltage, spot size, scanned area of e-beam, and the initial pore size have been discussed. It is found that single-crystal silicon nanopores shrink linearly with time under localized irradiation by SEM e-beam in all cases, and the pore shrinkage rate is inversely proportional to the initial equivalent diameter of the pore under the same e-beam conditions.

Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method

Fabrication of Silicon Nanopores with Tunable Shapes and Sizes

Fabrication of Nanopore and Nanopore Arrays in Si Substrate by Wet Etching Method at Wafer Scale

Fabrication of Silicon Nanopore Arrays Using A Combination of Dry and Wet Etching

Fabrication of Single-Crystal Silicon Nanoslits with Feature Sizes Down to 4 nm and High Length-Width Ratios

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

A Two-Step Etching Method to Fabricate Nanopores in Silicon

Fabrication of Silicon Nanopore Arrays with Three-Step Wet Etching

Fabrication of Nanoslits with <111> Etching TSWE Method

Fabrication Of Inverted-Pyramid Silicon Nanopore Arrays With Three-Step Wet Etching

Wafer-Scale Fabrication of V-Shaped Silicon Nano-Slit Arrays

Fabrication of Sub-Nanometer Pores on Graphene Membrane for Ion Selective Transport

A novel method to fabricate silicon nanopore arrays

Controllable Fabrication of Pyramidal Silicon Nanopore Arrays and Nanoslits for Nanostencil Lithography

Shape Formation Analysis of Silicon Nanopore Fabricated by Anisotropic Wet Etching Method

Fabrication of Hourglass-Shaped Solid-State Nanopores

Achieving a sub-10 nm nanopore array in silicon by metal-assisted chemical etching and machine learning

Fabrication of Multi-Size Nanopores Auto-Positioning on Pyramidal Membrane Tip by Multi-Level Voltage Pulses.

SEM-induced Shrinkage and Site-Selective Modification of Single-Crystal Silicon Nanopores

Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching

Controlled Deformation of Si3N4nanopores Using Focused Electron Beam in a Transmission Electron Microscope