Abstract:Solid-state nanopores with feature sizes around 5 nm play a critical role in bio-sensing fields, especially in single molecule detection and sequencing of DNA, RNA and proteins. In this paper we present a systematic study on shrinkage and site-selective modification of single-crystal silicon nanopores with a conventional scanning electron microscope (SEM). Square nanopores with measurable sizes as small as 8 nm × 8 nm and rectangle nanopores with feature sizes (the smaller one between length and width) down to 5 nm have been obtained, using the SEM-induced shrinkage technique. The analysis of energy dispersive x-ray spectroscopy and the recovery of the pore size and morphology reveal that the grown material along with the edge of the nanopore is the result of deposition of hydrocarbon compounds, without structural damage during the shrinking process. A simplified model for pore shrinkage has been developed based on observation of the cross-sectional morphology of the shrunk nanopore. The main factors impacting on the task of controllably shrinking the nanopores, such as the accelerating voltage, spot size, scanned area of e-beam, and the initial pore size have been discussed. It is found that single-crystal silicon nanopores shrink linearly with time under localized irradiation by SEM e-beam in all cases, and the pore shrinkage rate is inversely proportional to the initial equivalent diameter of the pore under the same e-beam conditions.

Fabrication of Silicon Nanopores with Tunable Shapes and Sizes

Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Fabrication of Silicon Nanopore Arrays Using A Combination of Dry and Wet Etching

Fabrication of Silicon Nanopore Arrays with Three-Step Wet Etching

SEM-induced Shrinkage and Site-Selective Modification of Single-Crystal Silicon Nanopores

A Two-Step Etching Method to Fabricate Nanopores in Silicon

Controllable Shrinking and Shaping of Silicon Nitride Nanopores under Electron Irradiation

Fabrication of Nanopore and Nanopore Arrays in Si Substrate by Wet Etching Method at Wafer Scale

Fabrication Of Inverted-Pyramid Silicon Nanopore Arrays With Three-Step Wet Etching

Shape Formation Analysis of Silicon Nanopore Fabricated by Anisotropic Wet Etching Method

Controlled Deformation of Si3N4nanopores Using Focused Electron Beam in a Transmission Electron Microscope

A novel method to fabricate silicon nanopore arrays

Fabrication of Hourglass-Shaped Solid-State Nanopores

Controllable Fabrication of Pyramidal Silicon Nanopore Arrays and Nanoslits for Nanostencil Lithography

Controllable Shrinking of Silicon Oxide Nanopores by High Temperature Annealing

Wafer-Scale Fabrication of V-Shaped Silicon Nano-Slit Arrays

Fabrication of Multi-Size Nanopores Auto-Positioning on Pyramidal Membrane Tip by Multi-Level Voltage Pulses.

Shrinking solid-state nanopores using electron-beam-induced deposition

Fabrication of Nanoporous Silicon Dioxide/silicon Nitride Membranes Using Etched Ion Track Technique

Photothermally Assisted Thinning of Silicon Nitride Membranes for Ultrathin Asymmetric Nanopores.