Abstract:Controlled fabrication of nanopores in atomically thin two-dimensional material offers the means to create robust membranes needed for ion transport, nanofiltration, and DNA sensing. Techniques for creating nanopores have relied upon either plasma etching or direct irradiation using electrons or ions; however, aberration-corrected scanning transmission electron microscopy (STEM) offers the advantage of combining a highly energetic, sub-angstrom sized electron beam for atomic manipulation along with atomic resolution imaging. Here, we utilize a method for automated nanopore fabrication with real-time atomic visualization to enhance our mechanistic understanding of beam-induced transformations. Additionally, an electron beam simulation technique, Electron-Beam Simulator (E-BeamSim) was developed to observe the atomic movements and interactions resulting from electron beam irradiation. Using the 2D MXene Ti3C2Tx, we explore the influence of temperature on nanopore fabrication by tracking atomic transformation pathways and find that at room temperature, electron beam irradiation induces random displacement of atoms and results in a pileup of titanium atoms at the nanopore edge. This pileup was confirmed and demonstrated in E-BeamSim simulations around the small, milled area in the MXene monolayer. At elevated temperatures, the surface functional groups on MXene are effectively removed, and the mobility of atoms increases, which results in atomic transformations that lead to the selective removal of atoms layer by layer. Through controllable manufacture using e-beam milling fabrication, the production and then characterization of the fabricated defects can be better understood for future work. This work can lead to the development of defect engineering techniques within functionalized MXene layers.

Controlled Deformation of Si3N4nanopores Using Focused Electron Beam in a Transmission Electron Microscope

Electron-beam-induced deformations of SiO2 nanostructures

Controllable Shrinking and Shaping of Silicon Nitride Nanopores under Electron Irradiation

Controlled size reduction and its underlying mechanism to form solid-state nanopores via electron beam induced carbon deposition

Fabrication of Silicon Nanopores with Tunable Shapes and Sizes

Fabrication of nanopores using electron beam

Controllable Shrinking Fabrication of Solid-State Nanopores

Fabrication of Nanopores with Subnanometer Precision on Poly(Methyl Methacrylate) Nanofibers by in Situ Electron Beam Irradiation

Shrinking solid-state nanopores using electron-beam-induced deposition

3D Nanopore Shape Control by Current-Stimulus Dielectric Breakdown

Controlled Manipulation and Multiscale Modeling of Suspended Silicon Nanostructures under Site-Specific Ion Irradiation

Photothermally Assisted Thinning of Silicon Nitride Membranes for Ultrathin Asymmetric Nanopores.

Fabrication of Metal Nanoscale Devices on Insulating Membranes by High-Resolution Atom Ablation

Nanopore Fabrication by Controlled Dielectric Breakdown

Fabrication Of Ultrafine Nanostructures With Single-Nanometre Precision In A High-Resolution Transmission Electron Microscope

Strain-induced Fabrication of Anisotropic Nanopores by In-situ E-Beam Irradiation

Fabrication of Faceted Nanopores in Magnesium

SEM-induced Shrinkage and Site-Selective Modification of Single-Crystal Silicon Nanopores

Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method

Direct Fabrication of Atomically Defined Pores in MXenes

Fabrication and Healing of Faceted Nanopores in Magnesium