Abstract:Thermodynamic behavior investigations on nanomaterials are of great scientific interest and possess technological implications for advancing nanoscience and nanotechnology. However, nanoscale thermodynamic studies on ceramic semiconductors are faced with great challenges due to their thermostability, and there lacks a percipient understanding of their atomistic thermal behaviors. Here, the atomic‐scale mechanism of the melting and coalescence processes of binary semiconductors, including rutile TiO2(R) and SnSe nanostructures, via real‐time electron beam (e‐beam) irradiation is reported. Under the e‐beam, the inelastic electron‐matter interactions and the low thermal conductivity of the samples cause a local temperature increase. The in situ melting process is recorded via high‐resolution TEM imaging, which exclusively shows a specific planar melting order of the (001), (011), and (100) for TiO2(R). This measurement provides direct evidence that matches the surface energy differences predicted by existing theoretical calculations and experiments. A similar phenomenon is induced and observed on SnSe, which derives a particular melting order of (210), (211), and (002). Furthermore, the in situ melting and coalescence analysis of ultrafine TiO2(R) nanoparticles suggests surface atom transfer and recrystallization as observed. The demonstration of e‐beam directed shape formation and tailoring reveals the possibility for nano/microscale processing of ceramic nanostructures, which are otherwise considered chemically stable and mechanically robust.

Controllable Shrinking and Shaping of Silicon Nitride Nanopores under Electron Irradiation

Atomic Investigation on the Facet‐Dependent Melting of Ceramic Nanostructures Via in Situ Electron Irradiation

SEM-induced Shrinkage and Site-Selective Modification of Single-Crystal Silicon Nanopores

Shrinking solid-state nanopores using electron-beam-induced deposition

Fabrication of Silicon Nanopores with Tunable Shapes and Sizes

Controlled Deformation of Si3N4nanopores Using Focused Electron Beam in a Transmission Electron Microscope

Electron-beam-induced deformations of SiO2 nanostructures

Controllable Shrinking of Inverted-Pyramid Silicon Nanopore Arrays by Dry-Oxygen Oxidation

Controllable Shrinking of Silicon Oxide Nanopores by High Temperature Annealing

Fabrication of Nanopores with Subnanometer Precision on Poly(Methyl Methacrylate) Nanofibers by in Situ Electron Beam Irradiation

Silicon Nanocrystal Growth under Irradiation of Electron Beam.

Highly Efficient Shrinkage of Inverted-Pyramid Silicon Nanopores by Plasma-Enhanced Chemical Vapor Deposition Technology

Photothermally Assisted Thinning of Silicon Nitride Membranes for Ultrathin Asymmetric Nanopores.

One-step Ion Beam Irradiation Manufacture of 3D Micro/nanopatterned Structures in SiC with Tunable Work Functions

Controlled size reduction and its underlying mechanism to form solid-state nanopores via electron beam induced carbon deposition

Shrinking of Silicon Nanopore Arrays by Direct Dry-Oxygen Oxidation

Shaping single walled nanotubes

Nanometer-scale modification and welding of silicon and metallic nanowires with a high-intensity electron beam.

In situ manipulation of E-beam irradiation-induced nanopore formation on molybdenum oxide nanowires

Controllable Si (100) Micro/nanostructures by Chemical-Etching-assisted Femtosecond Laser Single-Pulse Irradiation

Controlled thinning and surface smoothening of silicon nanopillars