Highly Efficient Shrinkage of Inverted-Pyramid Silicon Nanopores by Plasma-Enhanced Chemical Vapor Deposition Technology

Yifan Wang,Tao Deng,Qi Chen,Feng Liang,Zewen Liu
DOI: https://doi.org/10.1088/0957-4484/27/25/254005
IF: 3.5
2016-01-01
Nanotechnology
Abstract:Solid-state nanopore-based analysis systems are currently one of the most attractive and promising platforms in sensing fields. This work presents a highly efficient method to shrink inverted-pyramid silicon nanopores using plasma-enhanced chemical vapor deposition (PECVD) technology by the deposition of SiN x onto the surface of the nanopore. The contraction of the inverted-pyramid silicon nanopores when subjected to the PECVD process has been modeled and carefully analyzed, and the modeling data are in good agreement with the experimental results within a specific PECVD shrinkage period (∼0-600 s). Silicon nanopores within a 50-400 nm size range contract to sub-10 nm dimensions. Additionally, the inner structure of the nanopores after the PECVD process has been analyzed by focused ion beam cutting process. The results show an inner structure morphology change from inverted-pyramid to hourglass, which may enhance the spatial resolution of sensing devices.
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