Abstract:It has recently been shown that solid-state nanometer-scale pores ('nanopores') can be used as highly sensitive single-molecule sensors. For example, electrophoretic translocation of DNA, RNA and proteins through such nanopores has enabled both detection and structural analysis of these complex biomolecules. Control over the nanopore size is critical as the pore must be comparable in size to the analyte molecule in question. The most widely used fabrication methods are based on focused electron or ion beams and thus require (scanning) transmission electron microscopy and focused ion beam (FIB) instrumentation. Even though very small pores have been made using these approaches, several issues remain. These include the requirement of being restricted to rather thin, mechanically less stable membranes, particularly for pore diameters in the single-digit nanometer range, lack of control of the surface properties at and inside the nanopore, and finally, the fabrication cost. In the proof-of-concept study, we report on a novel and simple route for fabricating metal nanopores with apparent diameters below 20 nm using electrodeposition and real-time ionic current feedback in solution. This fabrication approach inserts considerable flexibility into the kinds of platforms that can be used and the nanopore membrane material. Starting from much larger pores, which are straightforward to make using FIB or other semiconductor fabrication methods, we electrodeposit Pt at the nanopore interface while monitoring its ionic conductance at the same time in a bi-potentiostatic setup. Due to the deposition of Pt, the nanopore decreases in size, resulting in a decrease of the pore conductance. Once a desired pore conductance has been reached, the electrodeposition process is stopped by switching the potential of the membrane electrode and the fabrication process is complete. Furthermore, we demonstrate that these pores can be used for single-biomolecule analysis, such as that of λ-DNA, which we use in a proof-of-concept study. Importantly, our approach is applicable to single nanopores as well as nanopore arrays, and can easily be extended to deposits of metal other than Pt.

A novel method to fabricate silicon nanopore arrays

Fabrication of Silicon Nanopore Arrays Using A Combination of Dry and Wet Etching

Fabrication of Silicon Nanopore Arrays with Three-Step Wet Etching

Fabrication of Nanopore and Nanopore Arrays in Si Substrate by Wet Etching Method at Wafer Scale

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Controllable Fabrication of Pyramidal Silicon Nanopore Arrays and Nanoslits for Nanostencil Lithography

Fabrication Of Inverted-Pyramid Silicon Nanopore Arrays With Three-Step Wet Etching

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Fabrication of Sub-Nanometer Pores on Graphene Membrane for Ion Selective Transport

Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method

Achieving a sub-10 nm nanopore array in silicon by metal-assisted chemical etching and machine learning

Fabrication of Silicon Nanopores with Tunable Shapes and Sizes

Fabrication of Sub-20 Nm Nanopore Arrays in Membranes with Embedded Metal Electrodes at Wafer Scales

Fabrication of Hourglass-Shaped Solid-State Nanopores

Electrochemically Etched Pore Array in Silicon with Large Spacing and High-Aspect-ratio

Wafer-Scale Fabrication of V-Shaped Silicon Nano-Slit Arrays

Rapid fabrication of solid-state nanopores with high reproducibility over a large area using a helium ion microscope.

Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching

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Precise electrochemical fabrication of sub-20 nm solid-state nanopores for single-molecule biosensing

Controllable Shrinking of Inverted-Pyramid Silicon Nanopore Arrays by Dry-Oxygen Oxidation