Abstract:A robust method of fabricating freestanding nanoporous silicon dioxide/silicon nitride membrane on a silicon holder using etched ion track technique was demonstrated in this paper. The basic track etching parameters of silicon dioxide and silicon nitride were studied and appropriate irradiation conditions were obtained. The freestanding membranes were obtained by standard silicon fabrication procedures. The multilayer composite silicon/silicon dioxide/silicon nitride was irradiated by Br ions with fluence of 108–1010cm−2. The latent ion tracks in silicon dioxide were then etched to the silicon nitride layer by aqueous HF solution (4%) to produce conical nanopores. Subsequently, these nanopores in silicon dioxide layer, acting as a mask, were transferred into the silicon nitride layer by reactive ion etching (RIE). Finally, with an extra HF wet etching step, the nanoporous silicon dioxide/silicon nitride membrane can be thinned to nanoporous silicon nitride membrane. The diameter of the nanopores in silicon nitride can be varied by varying the HF wet etching time. Via this method, nanoporous silicon dioxide/silicon nitride membrane with designed pore density and pore diameter of sub 100nm can be achieved.

Fabrication of Nanopore and Nanopore Arrays in Si Substrate by Wet Etching Method at Wafer Scale

Fabrication of Silicon Nanopore Arrays Using A Combination of Dry and Wet Etching

Fabrication of Silicon Nanopore Arrays with Three-Step Wet Etching

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

A novel method to fabricate silicon nanopore arrays

Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method

Fabrication Of Inverted-Pyramid Silicon Nanopore Arrays With Three-Step Wet Etching

A Two-Step Etching Method to Fabricate Nanopores in Silicon

Wafer-Scale Fabrication of V-Shaped Silicon Nano-Slit Arrays

Fabrication of Silicon Nanopores with Tunable Shapes and Sizes

Controllable Fabrication of Pyramidal Silicon Nanopore Arrays and Nanoslits for Nanostencil Lithography

Fabrication of Sub-20 Nm Nanopore Arrays in Membranes with Embedded Metal Electrodes at Wafer Scales

Achieving a sub-10 nm nanopore array in silicon by metal-assisted chemical etching and machine learning

Shape Formation Analysis of Silicon Nanopore Fabricated by Anisotropic Wet Etching Method

Electrochemically Etched Pore Array in Silicon with Large Spacing and High-Aspect-ratio

Fabrication of Hourglass-Shaped Solid-State Nanopores

A facile nanowire fabrication approach based on edge lithography

Patterned Microstructure Array Fabrication By Using A Novel Standing Surface Acoustic Wave Device

Silicon Nano-Wire Fabricated by Boe Silicon Etching

Fabrication of Multi-Size Nanopores Auto-Positioning on Pyramidal Membrane Tip by Multi-Level Voltage Pulses.

Fabrication of Nanoporous Silicon Dioxide/silicon Nitride Membranes Using Etched Ion Track Technique