Abstract:Nanopore sensing is a key technology for single-molecule detection and analysis. Solid-state nanopores have emerged as a versatile platform, since their fabrication allows to engineer their properties by controlling size, shape, and chemical functionalization. However, lithography-based fabrication approaches for non-planar nanopores-on-chip rely on polymers that have limits with respect to hard- and robustness, durability, and refractive index. In this respect, nanopores made of metal oxides with high dielectric constant would be much more favourable and have the potential to extend the suitability of solid-state nanopores towards optoelectronic technologies. Here, we present a versatile method to fabricate three-dimensional nanopores of different dielectric oxides with controlled shapes. Our approach uses photoresist only as a template in the focused-ion-beam lithography to define the nanopore shape, which is subsequently coated with different oxides (SiO2, Al2O3, TiO2 and HfO2) by atomic-layer deposition. Then the photoresist is fully removed by chemo-physical treatment, resulting in nanopores entirely made from dielectric oxides on a thin solid-state membrane. Our methodology allows straightforward fabrication of convex, straight, and concave nanopore shapes that can be employed in various technologies and applications. We explored their performance as ionic nanochannels and investigated the dependence of the ionic current rectification on the nanopore geometry. We found hysteresis in the ionic conductance that enables potential applications of the nanopores in memristors. We also investigated the dielectric oxide nanopores for DNA sensing by measuring both cis-trans and trans-cis translocations and support our data with numerical simulations based on the Poisson-Nernst-Planck model.

Fabrication of Multi-Size Nanopores Auto-Positioning on Pyramidal Membrane Tip by Multi-Level Voltage Pulses.

Self-Aligned Nanopore Formed on a SiO2 Pyramidal Membrane by a Multipulse Dielectric Breakdown Method

Fabrication of Sub-Nanometer Pores on Graphene Membrane for Ion Selective Transport

Fabrication of Nanopores Using Controlled Dielectric Breakdown

Multiple-Nanopores Fabrication Based on Dielectric Breakdown

Nanopore Fabricated in Pyramidal HfO2 Film by Dielectric Breakdown Method

Fabrication of Multiple Nanopores in a SiNx Membrane Via Controlled Breakdown.

Fabrication of Silicon Nanopores with Tunable Shapes and Sizes

Muitilpe Nanopores Fabrication in a SiNX Membrane Via Controlled Breakdown

Tailored Fabrication of 3D Nanopores with Dielectric Oxides for Multiple Nanoscale Applications

Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Fabrication of Hourglass-Shaped Solid-State Nanopores

Fast Fabrication Nanopores on a PMMA Membrane by a Local High Electric Field Controlled Breakdown

Nanopore Fabrication by Controlled Dielectric Breakdown

Fabrication of Silicon Nanopore Arrays Using A Combination of Dry and Wet Etching

Controllable Fabrication of Pyramidal Silicon Nanopore Arrays and Nanoslits for Nanostencil Lithography

Fabrication Of Inverted-Pyramid Silicon Nanopore Arrays With Three-Step Wet Etching

3D Nanopore Shape Control by Current-Stimulus Dielectric Breakdown

Fabrication of Nanopore and Nanopore Arrays in Si Substrate by Wet Etching Method at Wafer Scale

Fabrication of Sub-20 Nm Nanopore Arrays in Membranes with Embedded Metal Electrodes at Wafer Scales