Tailored Fabrication of 3D Nanopores with Dielectric Oxides for Multiple Nanoscale Applications

German Lanzavecchia,Anastasiia Sapunova,Ali Douaki,Shukun Weng,Dmitry Momotenko,Goncalo Paulo,Alberto Giacomello,Roman Krahne,Denis Garoli
2024-05-04
Abstract:Nanopore sensing is a key technology for single-molecule detection and analysis. Solid-state nanopores have emerged as a versatile platform, since their fabrication allows to engineer their properties by controlling size, shape, and chemical functionalization. However, lithography-based fabrication approaches for non-planar nanopores-on-chip rely on polymers that have limits with respect to hard- and robustness, durability, and refractive index. In this respect, nanopores made of metal oxides with high dielectric constant would be much more favourable and have the potential to extend the suitability of solid-state nanopores towards optoelectronic technologies. Here, we present a versatile method to fabricate three-dimensional nanopores of different dielectric oxides with controlled shapes. Our approach uses photoresist only as a template in the focused-ion-beam lithography to define the nanopore shape, which is subsequently coated with different oxides (SiO2, Al2O3, TiO2 and HfO2) by atomic-layer deposition. Then the photoresist is fully removed by chemo-physical treatment, resulting in nanopores entirely made from dielectric oxides on a thin solid-state membrane. Our methodology allows straightforward fabrication of convex, straight, and concave nanopore shapes that can be employed in various technologies and applications. We explored their performance as ionic nanochannels and investigated the dependence of the ionic current rectification on the nanopore geometry. We found hysteresis in the ionic conductance that enables potential applications of the nanopores in memristors. We also investigated the dielectric oxide nanopores for DNA sensing by measuring both cis-trans and trans-cis translocations and support our data with numerical simulations based on the Poisson-Nernst-Planck model.
Applied Physics
What problem does this paper attempt to address?
The main problems that this paper attempts to solve include: 1. **Limitations of existing nanopore technologies**: - **Material limitations**: Traditional polymer - based nanopores have limitations in terms of hardness, durability, and refractive index, especially in the fabrication of nanopores on non - planar chips. - **Geometric shape and functional diversity**: Existing nanopore fabrication methods are difficult to achieve complex three - dimensional shapes, which limits their potential in various applications. 2. **Improving the performance and applicability of nanopores**: - **Application of high - dielectric - constant materials**: By using metal oxides with high dielectric constants (such as SiO₂, Al₂O₃, TiO₂, HfO₂), the application of solid - state nanopores in fields such as optoelectronic technology and biosensing can be expanded. - **Influence of nanopore shape on function**: Research on how nanopores of different shapes (convex, straight, concave) affect ion - current rectification (ICR), DNA sensing, and memristor behavior. 3. **Developing a general fabrication method**: - **Flexible and controllable fabrication process**: A method combining focused - ion - beam lithography and atomic - layer deposition (ALD) is proposed, which can fabricate three - dimensional nanopores with arbitrary geometries on a chip. - **Technology for removing template materials**: The problem of complete removal of hardened photoresist is solved, ensuring that the final nanopore is composed only of metal oxides, thereby improving the chemical stability and optical performance of the nanopore. Through these efforts, the paper aims to overcome the limitations of existing nanopore technologies and develop more durable and multi - functional nanopore structures to meet the needs of applications such as single - molecule detection, DNA sensing, ion transport, and memristors.