Abstract:Nanofluidic systems are attracting a great deal of interest due to their fundamental significance and potential applications in chemistry, biology and physics. However, high fabrication cost, expensive equipments and complicated fabrication process of most current fabrication techniques prevent lots of researchers from entering the nanofluidic field. Here we present a quick, simple and cost-effective method for fabricating two-dimensional (2D) nanochannel in polycarbonate (PC) substrates. Silica nanowires, taper-drawn from commercially available single-mode fiber were used as templates and embedded in the PC substrate by hot embossing. The nanochannels were created after removing the nanowires by hydrofluoric acid (HF) etching. Poly(dimethylsiloxane) (PDMS) was used to seal the nanochannel reversibly. Nanochannels with widths range from 100 to 900 nm and lengths up to several millimeters were obtained. Various nanostructures including integrated micro and nanochannels, nanochannel array, bent nanochannel and cross-shaped nanochannel were fabricated and characterized by fluorescent microscope, scanning electron microscope (SEM) and atomic force microscope (AFM).

Wafer-Scale Fabrication of V-Shaped Silicon Nano-Slit Arrays

Simple and Cost-Effective Fabrication of Two-Dimensional Plastic Nanochannels from Silica Nanowire Templates

Fabrication of Single-Crystal Silicon Nanoslits with Feature Sizes Down to 4 nm and High Length-Width Ratios

Fabrication of Nanopore and Nanopore Arrays in Si Substrate by Wet Etching Method at Wafer Scale

Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Fabrication of Silicon Nanopore Arrays with Three-Step Wet Etching

Fabrication of Silicon Nanopore Arrays Using A Combination of Dry and Wet Etching

Wafer-scale Fabrication of High-Aspect Ratio Nanochannels Based on Edge-Lithography Technique.

Fabrication of Silicon Nanopores with Tunable Shapes and Sizes

A novel method to fabricate silicon nanopore arrays

Fabrication of Nanoslits with <111> Etching TSWE Method

A facile nanowire fabrication approach based on edge lithography

Patterned Microstructure Array Fabrication By Using A Novel Standing Surface Acoustic Wave Device

OS1503 Development of Highly Ordered Silicon Nanowire Array

Fabrication of 2D silicon nano-mold by side etch lift-off method

Achieving a sub-10 nm nanopore array in silicon by metal-assisted chemical etching and machine learning

Wafer Scale Fabrication of Highly Dense and Uniform Array of Sub-5 Nm Nanogaps for Surface Enhanced Raman Scatting Substrates.

Controllable Fabrication of Pyramidal Silicon Nanopore Arrays and Nanoslits for Nanostencil Lithography

Fabrication of in Situ Ultrathin Anodic Aluminum Oxide Layers for Nanostructuring on Silicon Substrate

Realization of the Microchannel with Microisland Arrays by One-Step Silicon Wet Etching Process