Abstract:A novel strategy for preparing large‐area, oriented silicon nanowire (SiNW) arrays on silicon substrates at near room temperature by localized chemical etching is presented. The strategy is based on metal‐induced (either by Ag or Au) excessive local oxidation and dissolution of a silicon substrate in an aqueous fluoride solution. The density and size of the as‐prepared SiNWs depend on the distribution of the patterned metal particles on the silicon surface. High‐density metal particles facilitate the formation of silicon nanowires. Well‐separated, straight nanoholes are dug along the Si block when metal particles are well dispersed with a large space between them. The etching technique is weakly dependent on the orientation and doping type of the silicon wafer. Therefore, SiNWs with desired axial crystallographic orientations and doping characteristics are readily obtained. Detailed scanning electron microscopy observations reveal the formation process of the silicon nanowires, and a reasonable mechanism is proposed on the basis of the electrochemistry of silicon and the experimental results.

Fabrication of Single-Crystal Silicon Nanoslits with Feature Sizes Down to 4 nm and High Length-Width Ratios

Fabrication of Nanoslits with <111> Etching TSWE Method

Wafer-Scale Fabrication of V-Shaped Silicon Nano-Slit Arrays

Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method

Silicon Nano-Wires Fabricated by Thermal Evaporation of Silicon Wafer

Fabrication of Nanopore and Nanopore Arrays in Si Substrate by Wet Etching Method at Wafer Scale

A facile nanowire fabrication approach based on edge lithography

Selective etching of n-type silicon in pn junction structure in hydrofluoric acid and its application in silicon nanowire fabrication.

Silicon Nano-Wire Fabricated by Boe Silicon Etching

Fabrication of Optofluidic Systems Using Isotropic Wet Etched Masters in < 111 > Silicon Wafer

Fabrication of Single‐Crystalline Silicon Nanowires by Scratching a Silicon Surface with Catalytic Metal Particles

Silicon Nano-Wires Fabricated by a Novel Thermal Evaporation of Zinc Sulfide

Fabrication of Silicon Nanopores with Tunable Shapes and Sizes

AFM Tip-Based Fabrication of Silicon Nanostructures with Reduced Subsurface Amorphous Layers

Wafer-scale Fabrication of High-Aspect Ratio Nanochannels Based on Edge-Lithography Technique.

Fabrication of Silicon Quantum Wires by Anisotropic Wet Chemical Etching and Thermal-Oxidation

Fabrication of Silicon Nanopore Arrays with Three-Step Wet Etching

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

SCS nano-structures fabricated by hybrid process of HNA selective etching and oxidization

Fabrication of 11-Nm-wide Silica-Like Lines Using X-Ray Diffraction Exposure

Nanowire FETs with Nearly Single-Crystalline Si Channels by NiSi2-Seed Initiated Lateral Epitaxial Crystallization (SILEC)