Abstract:Despite the continued scaling down of semiconductor manufacturing, traditional lithography-based nanofabrication only produces thin film structures, not 3-D shapes. 3-D nanofabrication remains a major challenge, especially for semiconductor materials. Most 3-D nanofabrication techniques, such as two-photon printing and stereolithography, mostly work for polymer materials, not solid-state semiconductor materials. Here, a method capable of fabricating sophisticated 3-D nanostructures of silicon based on the subsurface swelling phenomenon using focused helium ion swelling is reported. Silicon nanosphere arrays, hierarchical nanospheres mimicking compound lenses, nano-Taichi symbols, three-layer nanotowers, and nanopumpkins have been demonstrated, which are challenging for existing nanofabrication technology. The produced silicon nanostructures exhibit super small surface roughness as small as 0.1 nm, two orders of magnitude better than existing 3-D nanofabrication technologies normally above 10 nm. The super small surface roughness opens doors for many exciting applications in photonics, indicating small photon losses. Moreover, it is demonstrated ultraprecise fine-tuning of critical dimensions of ready-made nanostructures or nanodevices, such as tuning the tilting angle of the tip on the atomic force microscopy probe and reducing the nanogap between two metal electrodes from 200 to 4 nm, which is promising for improving nanodevice performances by tuning the critical dimensions to desired ranges.

Fabrication of 11-Nm-wide Silica-Like Lines Using X-Ray Diffraction Exposure

Photolithography Using Lateral Surface of Nanofibers

Subwavelength-resolution Direct Writing Using Submicron-Diameter Fibers

A strategy to fabricate nanostructures with sub-nanometer line edge roughness

Fabrication and Characterization of Sub-45 Nm Multiple Linewidth Samples

Microfabrication of Nano-Scale Feature Lines

Fabrication and Characterization of the Size-Controlled and Patterned Nc-Si Dots

λ/30 inorganic features achieved by multi-photon 3D lithography

Sub-10-nm suspended nano-web formation by direct laser writing

Sub-Diffraction Limited Nanogroove Fabrication of 30 Nm Features on Diamond Films Using 800 Nm Femtosecond Laser Irradiation

Fabrication of Single-Crystal Silicon Nanoslits with Feature Sizes Down to 4 nm and High Length-Width Ratios

Fabrication of Nanoimprint Mold by Multilayer Film Deposition Technique

Fabricating 3D Si nanostructure via a novel Ga+ implantation enabled maskless dry etching process

Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching

Fast Fabrication of Large-Area Two-Dimensional Micro/Nanostructure by Femtosecond Laser

SCS nano-structures fabricated by hybrid process of HNA selective etching and oxidization

Fabrication and characterization of typical nano scale structures

3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation

Fabrication of Nanostructures on 6H SiC Crystal Induced by Femtosecond Laser

Maskless Nanostructure Photolithography by Ultrahigh-Order Modes of a Symmetrical Metal-Cladding Waveguide

Fabrication of a concave grating with a large line spacing via a novel dual-beam interference lithography method