Fabrication of a concave grating with a large line spacing via a novel dual-beam interference lithography method

Li Xinghui,Ni Kai,Zhou Qian,Wang Xiaohao,Tian Rui,Pang Jinchao
DOI: https://doi.org/10.1364/OE.24.010759
IF: 3.8
2016-01-01
Optics Express
Abstract:We introduce a novel dual-beam interference lithography (IL) method that makes it possible to fabricate a concave grating with a large line spacing. A concave lens is placed between two point sources for spatial interference and a concave substrate to produce the grating pattern. The original positions of the two point sources are separated by the concave lens, which permits the IL method to fabricate a concave grating that bypasses the line spacing limitation of the conventional IL system. A concave grating with a line spacing of about 3.8 mu m was fabricated and fitted inside a miniature spectrometer. The enlarged line spacing reduces the detector length by 66.5%, while keeping the resolution better than 1.5 nm over a wide spectral band (360 - 825 nm). (C) 2016 Optical Society of America
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