Abstract:Optical metrology is widely used to characterize surface deformations due to the noncontact, full-field, and highly accurate nature of the measurements. In combination with advanced microscopes, optical metrology methods have recently been extended into the microand nanoscales. In measurements that use the moiré (beat pattern produced between gratings of initially equal spacing) method,1–3 gratings act as sensors that record the original deformation of a specimen. Precise preparation of the gratings is therefore required to ensure accurate measurements. Existing technologies for grating fabrication do not meet all the necessary requirements (i.e., production of high-frequency and large-area gratings at low cost) simultaneously. Ordinary photolithography, due to its diffraction limitation, can generally only produce gratings with hundreds of lines per millimeter. Holographic lithography can be used to make gratings with frequencies of up to 4800 lines per millimeter, but there are strict requirements on the optical system and the alignment techniques. Electron beam lithography and focused ion beam lithography can produce fine gratings with up to 10,000 lines per millimeter, but the grating area is very small (micrometer scale).4, 5 We have developed a new moiré grating fabrication method that is based on the nanoimprint lithography (NIL) technique.6 NIL creates nanoscale patterns through mechanical deformation and has low costs, high throughput, and high resolution. This process has already been used in several microelectronic engineering, optical engineering, and bioengineering applications. Our technique can be used to produce gratings with large areas and high frequencies on different specimens, and at fast rates (see Figure 1).7–9 The preparation of the stamp that is used for imprinting is a key issue in our method. When imprinting is conducted at low pressure, a full-contact condition (between the specimen and Figure 1. (a) Grating fabricated on a traditional (millimeter-scale dimensions) specimen (1200 lines per millimeter, cross type).7 (b) Grating fabricated on a thin (<1 m) film specimen (1200 lines per millimeter, cross type).8

Large Area 50nm Period Grating by Multiple Nanoimprint Lithography and Spatial Frequency Doubling

Wide-field 3D Nanoscopy on Chip Through Large and Tunable Spatial-Frequency-shift Effect

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Fabrication of 200nm period gold free-standing transmission gratings based on nanoimprint lithography

Fabrication of High-Density Moiré Gratings

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Fabrication of a concave grating with a large line spacing via a novel dual-beam interference lithography method

Refined Grating Fabrication Using Displacement Talbot Lithography

Large Area Direct Nanoimprinting of SiO2–TiO2 Gel Gratings for Optical Applications

Patterning Nanoscale Crossed Grating with High Uniformity by Using Two-Axis Lloyd's Mirrors Based Interference Lithography.

Method for Fabricating Large-Area Gratings with a Uniform Duty Cycle Without a Spatial Beam Modulator

Tuning the Period of Nanogratings Using Mechanical Stretching and Nanoimprint Lithography

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

Two-Dimensional Grating Fabrication Based on Ultra-Precision Laser Direct Writing System

100 Nm Period Gratings Produced by Lithographically Induced Self-Construction

A nanoimprint lithography for fabricating SU-8 gratings for near-infrared to deep-UV application

Research on manufacturing technology of nanoimprinted grating

Double transfer UV-curing nanoimprint lithography.

Large-area commercial-grating-quality subwavelength periodic ripples on silicon efficiently fabricated by gentle ablation with femtosecond laser interference via two cylindrical lenses

Subwavelength Grating Structures with Magnetic Resonances at Visible Frequencies Fabricated by Nanoimprint Lithography for Large Area Applications

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography