Design and Fabrication of 1300-Line/mm Polarization-Independent Reflection Gratings for Spectral Beam Combining

Xinyu Mao,Chaoming Li,Keqiang Qiu,Lijiang Zeng,Lifeng Li,Xinrong Chen,Jianhong Wu,Zhengkun Liu,Shaojun Fu,Yilin Hong
DOI: https://doi.org/10.1016/j.optcom.2019.124883
IF: 2.4
2020-01-01
Optics Communications
Abstract:We designed and fabricated polarization-independent multilayer dielectric reflection gratings of 1300 line/mm for spectral beam combining. Because the designed grating has a duty cycle (or fill factor) much greater than 0.5, we used the lift-off process to invert a less-than-0.5 duty cycle photoresist mask to a greater-than-0.5 duty cycle chromium mask. Because the simultaneous polarization-independence and high-angular-dispersion requirements greatly reduce fabrication tolerance, we employed the end-point detection techniques to control accurately the duty cycle and groove depth of the grating profile to reach the design target. The measured polarization-averaged diffraction efficiency of the fabricated gratings was greater than 97% in the wavelength range of 1050 nm-1080 nm.
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