Abstract:Large-size diffraction gratings are essential for pulse compressors in chirped-pulse-amplified high-power laser systems, spectroscopic telescopes, etc. Fabricating large gratings requires large-aperture laser beams with collimated and aberration-free wavefronts. As an alternative a method of making monolithic gratings by optical mosaic has been proposed, which makes multiple-exposures in different areas of a substrate to enlarge the grating size. Between exposures the position and attitude of substrate must be adjusted to minimize the overall wavefront errors, with very tight accuracy requirements (similar to dozens of nanometers and tenths of micro-radians, respectively).We fully utilize the latent fringes (exposed but undeveloped fringes in photoresist) as the core reference object and the exposure beams as the adjustment beams to adjust and lock the position and attitude between consecutive exposures. This approach greatly simplifies the alignment system and eliminates many system errors. However, the diffraction efficiency of a latent grating is extremely weak (similar to 10(-5)) and excessive exposure of the latent fringes during the position and attitude adjustment should be avoided. We overcome these difficulties by carefully blocking stray lights and using a high-sensitivity CCD to monitor the interference fringes of the -1st- and 0th-order latent-fringe diffracted wavefronts. Experimentally we have made 2 x 2 mosaics of (60+28) x (53+30) mm(2) grating area. Typical peak-valley and root-mean-square values of the measured -1st-order diffraction wavefront errors are 0.06 lambda and 0.01 lambda, respectively.The mosaic conditions, detailed alignment steps, and experimental results showing position and attitude controllability will be presented. Important issues of extending the present work to large-size (possibly sub-meter) fabrication will also be discussed.

Fabrication of broadband, high-efficiency, metal-multilayer-dielectric gratings

High-efficiency, broad-bandwidth metal/multilayerdielectric gratings

Design of Large-Deflection-angle High-Diffraction-efficiency High-Dispersion Hybrid Gratings

Design and analysis of broadband high-efficiency pulse compression gratings

Metal/multilayer-dielectric Coated Grating for Chirped Pulse Amplification Laser System

Design of a High-Efficiency Multilayer Dielectric Diffraction Grating with Enhanced Laser Damage Threshold

High-efficiency Metallic Diffraction Gratings for Laser Applications.

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

Design and Fabrication of 1300-Line/mm Polarization-Independent Reflection Gratings for Spectral Beam Combining

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Development of broadband high efficiency Mid-IR gratings for high-energy ultrafast lasers

Design of High-Efficiency Dielectric Reflection Gratings

975 nm multimode semiconductor lasers with high-order Bragg diffraction gratings

Fabrication of Polarization Independent Gratings Made on Multilayer Dielectric Thin Film Substrates

Low-dispersion low-loss dielectric gratings for efficient ultrafast laser pulse compression at high average powers

High efficiency multilayer coated laminar gratings with high line density for tender X-ray region

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Inscription of Bragg gratings in undoped PMMA mPOF with Nd:YAG laser at 266 nm wavelength

Fabrication of Optical Mosaic Gratings by Consecutive Holographic Exposures Employing A Latent-Fringe Based Alignment Technique