Fabrication of Gratings with Low Spacing Error by the Dual-Beam Exposure System with Spherical Lens

Shiwei Wang,Lijiang Zeng

DOI: https://doi.org/10.1364/cleo_at.2015.jth2a.104

2015-01-01

Abstract:We propose a feedback method of adjusting the dual-beam exposure system with spherical collimation lenses based on deducing the spacing error from diffraction wavefront. The grating of 0.03 λ in 70×70 mm 2 can be achieved.

What problem does this paper attempt to address?

Design of Large-Deflection-angle High-Diffraction-efficiency High-Dispersion Hybrid Gratings

Jianjie Dong,Cuifang Kuang,Chun Cao,Xiaoming Shen,Xianmeng Xia,Yiwei Qiu,Lingling Guan,Wenji Liu

DOI: https://doi.org/10.1016/j.optcom.2023.130083

IF: 2.4

2024-01-01

Optics Communications

Abstract:Gratings are key components in many optical systems such as spectrometers. Improving their dispersion is very important for their applications, but improving the single-order diffraction efficiency of an ultrahigh dispersion grating is still very challenging. Here, we propose an analytical approach for the design of a new type of grating named hybrid grating, which consists of a subwavelength grating and a non-subwavelength grating. The proposed analytical approach is based on a physical model in which the non-subwavelength grating acts as an ultrathin reflection grating and the subwavelength grating acts as an antireflection coating. Using the rigorous coupled-wave analysis and the finite-difference time-domain method, we numerically demonstrate that multiple hybrid gratings designed at different wavelengths using the proposed analytical approach show a diffraction efficiency of greater than 95 % in the -1st diffraction order for TE-polarized light, an angular dispersion of greater than 0.8 mrad/nm and a deflection angle of greater than 80 degrees. Furthermore, we numerically demonstrate that by using a combined approach to optimize the parameters of a hybrid grating, the diffraction efficiency in the -1st diffraction order for TE-polarized light can be increased to more than 97 % under the condition that the angular dispersion and the deflection angle of the hybrid grating remain unchanged. Our work provides an avenue for rapid design of gratings with high angular dispersion, large deflection angle and high diffraction efficiency.
Wavefront Aberration Compensation Method to Fabricate Large Gratings with Low Spacing Error Using Broad-beam Scanning Exposure

Yuxuan Zhao,Lijiang Zeng

DOI: https://doi.org/10.1364/cleo_at.2018.af3m.5

2018-01-01

Abstract:A wavefront aberration compensation method is proposed to reduce the spacing error accumulation in broad-beam scanning exposure. A 200 mm × 100 mm grating with a spacing error of 0.07 λ was fabricated.
A Single Collimating Lens Based Dual-Beam Exposure System for Fabricating Long-Period Grating

Vunam Le,Guanhao Wu,Lijiang Zeng

DOI: https://doi.org/10.1016/j.optcom.2019.125139

IF: 2.4

2020-01-01

Optics Communications

Abstract:A single collimating lens based dual-beam exposure system is proposed in this paper in which two interference beams share one collimating lens. Based on theoretical analysis and simulation, the interference aberration caused by the pinholes on the off-axis positions is compensated through feedback adjustment of the pinholes' relative position. This system is more compact and stable, and can avoid the spatial position interference between two collimating lenses in traditional dual-beam exposure systems for fabricating long-period gratings. A 5 mu m period grating exposure system is constructed to verify the theoretical analysis. Using the proposed adjustment method, a spacing error of approximately 0.03 lambda within the aperture of 65 mm x 65 mm is achieved.
Fabrication of a Two-Dimensional Diffraction Grating by a Two-Axis Lloyd's Mirror Interferometer

Kazuki MANO,Ryo AIHARA,Yuki SHIMIZU,Yuan-Liu CHEN,Wei GAO

DOI: https://doi.org/10.1299/jsmelem.2017.9.077

2017-01-01

Proceedings of International Conference on Leading Edge Manufacturing in 21st century LEM21

Abstract:This paper presents an optical setup to fabricate a large-area two-dimensional diffraction grating by using a two-axis Lloyd's mirror interferometer. In order to fabricate large-area gratings, a large collimating lens, which generates a large diameter collimated beam, is integrated into the optical setup. In this paper, an evaluation of the intensity distribution of the collimated beam and an exposure experiment are carried out. In addition, the fabricated grating is measured by an atomic force microscope to evaluate the effectiveness of the developed setup with the large collimating lens.
Analysis and Minimization of Spacing Error of Holographic Gratings Recorded with Spherical Collimation Lenses

Shiwei Wang,Lijiang Zeng

DOI: https://doi.org/10.1364/oe.23.005532

IF: 3.8

2015-01-01

Optics Express

Abstract:This research proposes a feedback method to adjust the dual-beam exposure system with spherical collimation lenses to achieve gratings with low spacing error. Through theoretical analysis and numerical calculation, it is proved that the interference aberration can be analyzed with the Zernike polynomials and the adjustment errors can be estimated according to the linear relationship between the errors and the polynomial coefficients. Moreover moving the substrate along its normal is proposed to decrease the spacing error but keep the grating's period unchanged. In the experiments, the wavefront measurement results of the ± 1st orders are used to deduce the spacing error. Based on the feedback adjustment method, the grating with a spacing error of 0.03 λ within 70 mm × 70 mm is fabricated with the collimation lenses of 0.6 λ spherical aberration.
Design of Off-angle Beaming Device Based on Subwavelength Metal Thin Film Microstructure

WANG Bao-qing,Zhenrong Zheng,Peifu Gu,LI Yi-yu

IF: 0.6

2009-01-01

ACTA PHOTONICA SINICA

Abstract:The finite-difference time-domain(FDTD)method was used to simulate the propagation of P polarized light Gaussian beam in a single subwavelength metallic(Ag)slit surrounded by gratings.Because of the effect of surface plasmons wave,slit with symmetric grating can realize symmetric diffraction,and special asymmetric structure can achieve off-angle beaming phenomenon.Through formula Derivation and Helmholtz reciprocity theorem,devices for parallel beam of P polarized light could be designed.With the Gaussian beam's divergence and near-field distribution,the structural parameters of devices for Gaussian beam shrinks by 12%.On the basis of optimizating some other structures parameters,the design of symmetric diffracted and off-angle beaming effect device for 633 nm Gaussian beam were achieved.
Application of Broad-Beam Scanning Exposure to Fabricate Low-Wavefront-error Holographic Gratings

Yuxuan Zhao,Lijiang Zeng,Lifeng Li

DOI: https://doi.org/10.1117/1.oe.60.4.047105

IF: 1.3

2021-01-01

Optical Engineering

Abstract:Gratings with low diffracted wavefront errors are crucial in many applications. Existing methods to reduce the diffracted wavefront errors of holographically produced gratings mainly address misalignment errors during exposure system adjustment, leaving the inevitable residual errors of collimation lenses uncorrected. The broad-beam scanning exposure method was recently proposed to fabricate gratings with large size and low stray light. We explore its ability to reduce the diffracted wavefront errors caused by both system misalignment and lens errors. During the exposure, the substrate translates in the direction perpendicular to the grating lines to pass through the exposure area, so the aberrations over different parts of the interference field along the scanning path are averaged. We prove the validity of this method by a theoretical analysis and numerical simulations. The averaging effect on different aberrations and with different scanning lengths is discussed. The peak-valley values of diffracted wavefront errors of gratings fabricated with an exposure field of defocus aberration and a more complicated aberration were reduced by 42.5% and 50%, respectively. (C) 2021 Society of Photo-Optical Instrumentation Engineers (SPIE)
Analysis of a Lloyd's Mirror Interferometer for Fabrication of Gratings

Zongwei Ren,Ryo Aihara,Yuki Shimizu,So Ito,Yuan-Liu Chen,Wei Gao

DOI: https://doi.org/10.1109/nano.2016.7751443

2016-01-01

Abstract:This paper presents the analysis of an orthogonal multi-beam Lloyd's mirror interferometer for fabrication of two-axis gratings, which is employed as a measurement standard. Conventionally, for the fabrication of such complicated micro patterns, ultra-precision turning with a fast tool servo or lithography process with masks has been employed. However, they require long machining or fabrication time. Meanwhile, laser interference lithography such as the Lloyd's mirror interferometer is expected as a candidate for fabrication of such periodic micro patterns. In this paper, a new optical configuration is designed based on the Lloyd's mirror interferometer. In the proposed design, differing from the one in the previous study, two mirrors and a substrate are set to be perpendicular with each other to fabricate two-axis grating patterns having both symmetric profiles and uniform depths over the wide fabrication area, which has been difficult to be achieved in the previous study. A design and fabrication of the optical configuration for the orthogonal multi-beam Lloyd's mirror interferometer, and some experimental results with the interferometer will be reported.
Fabrication of Low-Stray-Light Gratings by Broad-Beam Scanning Exposure in the Direction Perpendicular to the Grating Grooves

Donghan Ma,Lijiang Zeng

DOI: https://doi.org/10.1364/ol.40.001346

IF: 3.6

2015-01-01

Optics Letters

Abstract:Previous research on making low-stray-light gratings is mainly focused on process steps after the photoresist mask has been made. We propose to improve the quality of the photoresist mask directly in exposure. We present a broad-beam scanning exposure method along the grating vector (i.e., in the direction perpendicular to the grating grooves), utilizing a reference grating clamped below the substrate on the translation stage for phase and attitude locking. Scanning-exposed gratings with a size of 40 mm x 40 mm are successfully made, which have straighter grooves and smoother surfaces, and their stray light levels around the first and second diffraction orders are decreased significantly. (C) 2015 Optical Society of America
Fabrication of a concave grating with a large line spacing via a novel dual-beam interference lithography method

Li Xinghui,Ni Kai,Zhou Qian,Wang Xiaohao,Tian Rui,Pang Jinchao

DOI: https://doi.org/10.1364/OE.24.010759

IF: 3.8

2016-01-01

Optics Express

Abstract:We introduce a novel dual-beam interference lithography (IL) method that makes it possible to fabricate a concave grating with a large line spacing. A concave lens is placed between two point sources for spatial interference and a concave substrate to produce the grating pattern. The original positions of the two point sources are separated by the concave lens, which permits the IL method to fabricate a concave grating that bypasses the line spacing limitation of the conventional IL system. A concave grating with a line spacing of about 3.8 mu m was fabricated and fitted inside a miniature spectrometer. The enlarged line spacing reduces the detector length by 66.5%, while keeping the resolution better than 1.5 nm over a wide spectral band (360 - 825 nm). (C) 2016 Optical Society of America
Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

Lijiang Zeng,Lei Shi,Lifeng Li

DOI: https://doi.org/10.4028/www.scientific.net/kem.437.56

2010-01-01

Key Engineering Materials

Abstract:Contemporary chirped-pulse-amplified high-power laser systems rely on meter-sized diffraction gratings for pulse compression. Fabricating large gratings is a bottle-neck problem. We developed a multiple-holographic-exposure method to fabricate large monolithic gratings. In consecutive exposures, the attitude of the photoresist-coated substrate is monitored and adjusted by using two interferometers with a He-Ne laser, and the relative position between the substrate and the exposure interference fringes is adjusted by using the interference fringes between the diffraction orders of the latent grating with the exposure beams as the incident beams. A mosaic grating with a size of 80×50 mm2 was fabricated, and the wavefront aberration of the 1st-order diffraction wavefront in the mosaic area is better than /10 PV @633 nm.
A Method of Fabricating Wide Spectrum Flat-Field Concave Grating with Compensation Concave Lens

Zhou Qian,Tian Rui,Ni Kai,Pang Jinchao,Zhang Jinchao

DOI: https://doi.org/10.1117/12.2072023

2014-01-01

Abstract:Flat-field concave diffraction grating is the key component of a portable grating spectrometer, which integrates three optical properties: dispersion, imaging, and flat spectral image in a single device. In recent years, fabricating concave grating has attracted much attention. However, the distance between two exposure light sources in the fabrication light system are often short, which makes it difficult to build the fabrication structure, sometimes even impossible. In order to solve this problem, two methods have been adopted. One is using special microscope objectives, but it reduces the system's ability of eliminating of aberrations. The other way is building spatial filters respectively, but this adds the difficulty of the system installing and adjustment, furthermore, it makes it impossible to fabricate wide spectrum FCDG. In this paper, a method to increase the distance between the two exposure light sources is proposed by using a compensation mirror. The use of compensation mirror can not only reduce the difficulty of fabricating grating, but also achieve results almost as better as that of the two original exposure points. We calculated the two new exposure points position with Matlab, and then performed system modeling, simulation and optimization in the Zemax software. A theoretical analysis is given to show that the proposed method can ensure the spectral image quality and greatly reduce the fabrication difficulty.
Method for Fabricating Large-Area Gratings with a Uniform Duty Cycle Without a Spatial Beam Modulator

Jiujiu Liang,Chongyu Wang,Haiou Lu,Xiaohao Wang,Kai Ni,Qian Zhou

DOI: https://doi.org/10.1364/oe.438235

IF: 3.8

2021-01-01

Optics Express

Abstract:A fabrication method for large-area gratings with uniform duty without using a spatial beam modulator is introduced in this study. The inhomogeneity of gratings caused by flaws of the lens and stray light was solved by controlling exposure time within an appropriate range and selecting a suitable beam expansion aperture in the optical path. A model for representing this process was established by analyzing the effects of exposure and development time length, and experimental results exhibited good agreement with the simulation results. Finally, a grating with a period of 550 nm, a uniform duty cycle, and a diameter larger than 30 mm was achieved using a Mach-Zehnder interferometer optical path without a spatial beam modulator. The uniformity of this grating was observed via atomic force microscopy, and the results were highly desirable.
Coma Optimization in Single Spherical Collimating Lens-Based Dual-Beam Exposure System

Vunam Le,Guanhao Wu,Lijiang Zeng

DOI: https://doi.org/10.1117/1.oe.59.9.094103

IF: 1.3

2020-01-01

Optical Engineering

Abstract:The single collimating lens-based dual-beam exposure system is a holographic exposure system that is suitable for fabricating long-period gratings. The interference wavefront aberration in this system requires optimization. We analyzed the coma of a single collimating lens-based dual-beam exposure system, and the linear relationships between the coma and the positions of the pinholes and substrate are obtained. Based on these relationships, we can eliminate the coma by adjusting the pinholes or substrate along the optical axis of the collimating lens. Consequently, the defocus aberration, astigmatism, low-order spherical aberration, and coma are all simultaneously optimized by adjusting the exposure system to meet the pinhole symmetry condition and coma optimization condition. Because the optimized interference wavefront aberration includes only high-order aberrations with low peak to valley values, a high-quality exposure wavefront can be obtained. Furthermore, a 5-mu m period grating exposure system is constructed with a spherical collimating lens of 0.6 lambda spherical aberration. Through the optimization process, a low spacing error of similar to 0.04 lambda within an aperture of 65 x 65 mm(2) is achieved (the theoretical value is 0.002 lambda). (C) 2020 Society of Photo-Optical Instrumentation Engineers (SPIE)
Fabrication Of Optical Mosaic Gratings With Phase And Attitude Adjustments Employing Latent Fringes And A Red-Wavelength Dual-Beam Interferometer

Lei Shi,Lijiang Zeng,Lifeng Li

DOI: https://doi.org/10.1364/OE.17.021530

IF: 3.8

2009-01-01

Optics Express

Abstract:We present a method to make optical mosaic gratings that uses the exposure beams and the latent grating created by the previous exposure to adjust the lateral position and readjust the attitude of the substrate for the current exposure. As thus, it is a direct method without using any auxiliary reference grating(s) and it avoids the asynchronous drifts between otherwise independent exposure and alignment optical sub-systems. In addition, the method uses a red laser wavelength in the plane-mirror interferometers for the multi-dimensional attitude adjustment, so the adjustment can be done at leisure. The mosaic procedure is described step by step, and the principles to minimize substrate alignment errors are explained in detail. Experimentally we made several mosaics of (50 + 30) x 50 mm(2) final grating area. The typical peak-valley and root-mean-square values of the measured -1st-order diffraction wavefront errors are 0.036. and 0.006., respectively. (C) 2009 Optical Society of America
Fabrication of Optical Mosaic Gratings by Consecutive Holographic Exposures Employing A Latent-Fringe Based Alignment Technique

Lei Shi,Lijiang Zeng

DOI: https://doi.org/10.1117/12.869727

2010-01-01

Abstract:Large-size diffraction gratings are essential for pulse compressors in chirped-pulse-amplified high-power laser systems, spectroscopic telescopes, etc. Fabricating large gratings requires large-aperture laser beams with collimated and aberration-free wavefronts. As an alternative a method of making monolithic gratings by optical mosaic has been proposed, which makes multiple-exposures in different areas of a substrate to enlarge the grating size. Between exposures the position and attitude of substrate must be adjusted to minimize the overall wavefront errors, with very tight accuracy requirements (similar to dozens of nanometers and tenths of micro-radians, respectively).We fully utilize the latent fringes (exposed but undeveloped fringes in photoresist) as the core reference object and the exposure beams as the adjustment beams to adjust and lock the position and attitude between consecutive exposures. This approach greatly simplifies the alignment system and eliminates many system errors. However, the diffraction efficiency of a latent grating is extremely weak (similar to 10(-5)) and excessive exposure of the latent fringes during the position and attitude adjustment should be avoided. We overcome these difficulties by carefully blocking stray lights and using a high-sensitivity CCD to monitor the interference fringes of the -1st- and 0th-order latent-fringe diffracted wavefronts. Experimentally we have made 2 x 2 mosaics of (60+28) x (53+30) mm(2) grating area. Typical peak-valley and root-mean-square values of the measured -1st-order diffraction wavefront errors are 0.06 lambda and 0.01 lambda, respectively.The mosaic conditions, detailed alignment steps, and experimental results showing position and attitude controllability will be presented. Important issues of extending the present work to large-size (possibly sub-meter) fabrication will also be discussed.
Characterization of Dual-Periodic Structures with Optical Scattering

Jun Wang,Wei Zhou,Anand K. Asundi,Lennie E. N. Lim,Er-Ping Li

DOI: https://doi.org/10.1016/j.measurement.2010.09.007

IF: 5.6

2010-01-01

Measurement

Abstract:Laser scattering method as a non-contact method provides an opportunity to real-time monitor the evolution of periodic nanostructures during fabrication, e.g. when the surface is irradiated with a focused ion beam. Using the method, the diffraction angle needs calibrating according to the grating equation. In this paper, we used scalar analysis to demonstrate the use of a dual-period structure for formation of dual spectral peaks at the 1st diffraction order. We then made use of numerical study based on rigorous coupled-wave analysis to optimize these Al-grating structures in terms of depth. It is found that dual-peak wavelengths can be selected by using different angles of incidence and low-loss reflection is obtained using an optimized structure. It is further proposed that these wavelengths can be used to determine the diffraction angle during fabrication without the need for pre-calibration of an optical scattering system.
Fabrication of Optical Mosaic Gratings: a Self-Referencing Alignment Method

Lei Shi,Lijiang Zeng

DOI: https://doi.org/10.1364/oe.19.008985

IF: 3.8

2011-01-01

Optics Express

Abstract:We propose and demonstrate a self-referencing alignment technique to conveniently enlarge fabricated grating area. The latent image gratings are used as the reference objects to align (adjust and lock) the attitude and position of the substrate relative to the exposure beams between and during consecutive exposures. The adjustment system and the fringe-locking system are combined into the exposure system, eliminating the drift errors between them and making the whole system low-cost and compact. For the fabricated 1 × 4 mosaics of 50 × (30 + 30 + 30 + 30) mm(2) area and 1 × 2 mosaics of 90 × (80 + 80) mm(2) area, the typical peak-valley -1st-order wavefront errors measured by a 100-mm-diameter interferometer are not more than 0.06 λ and 0.09 λ, respectively.
Method to Fabricate Orthogonal Crossed Gratings by an Interference Fringe Based Alignment Technique

Hengyan Zhou,Lijiang Zeng

DOI: https://doi.org/10.1117/12.2247443

2016-01-01

Abstract:In order to fabricate orthogonal crossed gratings, we propose an interference fringe based alignment technique to adjust the angle between the two Lloyd’s mirrors to be 90° in the dual Lloyd’s mirror interferometer. An exposed crossed grating is put back to the exposure system and rotated about 90° around its normal direction. By observing the fringe spacing of the interference fringes generated by the diffracted beams of different orders, we can adjust the angle between the two Lloyd’s mirrors to be 90°. Simulation results indicate an orthogonality error smaller than 4″ can be obtained by this method. We fabricated a crossed grating with 0.30″ orthogonality error.
Spectral Beam Combining Gratings: High Diffraction Efficiency at a Large Deviation Angle Achieved Around Conical Littrow Mounting

Kairu Wei,Lifeng Li

DOI: https://doi.org/10.1364/ol.440150

IF: 3.6

2021-01-01

Optics Letters

Abstract:We theoretically make plausible and numerically verify that when a high-efficiency, polarization-independent grating, designed to work at or near Littrow mounting, is used in conical Littrow mounting, its high efficiency and polarization independence can be very well maintained at a large off-principal-plane deviation angle. This finding provides a new degree of freedom to the design of high-efficiency, more compact spectral beam combining grating systems.

Fabrication of Gratings with Low Spacing Error by the Dual-Beam Exposure System with Spherical Lens

Design of Large-Deflection-angle High-Diffraction-efficiency High-Dispersion Hybrid Gratings

Wavefront Aberration Compensation Method to Fabricate Large Gratings with Low Spacing Error Using Broad-beam Scanning Exposure

A Single Collimating Lens Based Dual-Beam Exposure System for Fabricating Long-Period Grating

Fabrication of a Two-Dimensional Diffraction Grating by a Two-Axis Lloyd's Mirror Interferometer

Analysis and Minimization of Spacing Error of Holographic Gratings Recorded with Spherical Collimation Lenses

Design of Off-angle Beaming Device Based on Subwavelength Metal Thin Film Microstructure

Application of Broad-Beam Scanning Exposure to Fabricate Low-Wavefront-error Holographic Gratings

Analysis of a Lloyd's Mirror Interferometer for Fabrication of Gratings

Fabrication of Low-Stray-Light Gratings by Broad-Beam Scanning Exposure in the Direction Perpendicular to the Grating Grooves

Fabrication of a concave grating with a large line spacing via a novel dual-beam interference lithography method

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

A Method of Fabricating Wide Spectrum Flat-Field Concave Grating with Compensation Concave Lens

Method for Fabricating Large-Area Gratings with a Uniform Duty Cycle Without a Spatial Beam Modulator

Coma Optimization in Single Spherical Collimating Lens-Based Dual-Beam Exposure System

Fabrication Of Optical Mosaic Gratings With Phase And Attitude Adjustments Employing Latent Fringes And A Red-Wavelength Dual-Beam Interferometer

Fabrication of Optical Mosaic Gratings by Consecutive Holographic Exposures Employing A Latent-Fringe Based Alignment Technique

Characterization of Dual-Periodic Structures with Optical Scattering

Fabrication of Optical Mosaic Gratings: a Self-Referencing Alignment Method

Method to Fabricate Orthogonal Crossed Gratings by an Interference Fringe Based Alignment Technique

Spectral Beam Combining Gratings: High Diffraction Efficiency at a Large Deviation Angle Achieved Around Conical Littrow Mounting