Abstract:A two-axis Lloyd's mirrors interferometer based optical fabrication system was theoretically investigated and constructed for patterning high-uniformity nanoscale crossed grating structures over a large area with a high throughput. The current interferometer was configured with two reflected mirrors and a grating holder, which are placed edge by edge and orthogonal with each other. In such a manner, the two beams reflected from the two mirrors interfere with the incident beam, respectively, forming a crossed grating patterns with only one exposure. Differing from the conventional solution for elimination of unexpected interference between the two reflected beams, a systematical analysis, that is based on the proposed index indicating the non-orthogonality between the two beams at different incident angles, was conducted by using a spatial full polarization tracing method. Without polarization modulation to eliminate the additional interference, an optimal exposure condition with small non-orthogonality between reflected beams was found at a certain incident angle range, while the two required interferences to construct cross grating still remain high. A pattern period of ∼1 µm-level crossed grating structure could be obtained through balancing the structure area and the non-orthogonality. Finally, the exposure setup with orthogonal two-axis Lloyd's mirrors interferometer is established, and the crossed grating structure with the periods of 1076 nm along X-direction and 1091 nm along Y-direction was successfully fabricated on a silicon substrate via microfabrication technology over a large area of 400 mm2. The uniformity of crossed grating array over the whole area was evaluated by an atomic force microscope, and the standard deviations of structure periods along X- and Y-directions smaller than 0.3% are achieved. It is demonstrated that the orthogonal two-axis Lloyd's mirrors interferometer based on single-beam single-exposure scheme with non-orthogonality systematic analysis is an effective approach to fabricate crossed grating patterns of 1 µm-level period with high uniformity over a large area.

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Fabrication Of Optical Mosaic Gratings With Phase And Attitude Adjustments Employing Latent Fringes And A Red-Wavelength Dual-Beam Interferometer

Fabrication of Optical Mosaic Gratings by Consecutive Holographic Exposures Employing A Latent-Fringe Based Alignment Technique

Analysis of a Lloyd's Mirror Interferometer for Fabrication of Gratings

Optical Mosaic Gratings Made by Consecutive, Phase-Interlocked, Holographic Exposures Using Diffraction from Latent Fringes

Design and Testing of a Compact Non-Orthogonal Two-Axis Lloyd's Mirror Interferometer for Fabrication of Large-Area Two-Dimensional Scale Gratings

Fabrication of a Two-Dimensional Diffraction Grating by a Two-Axis Lloyd's Mirror Interferometer

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Optimization and Fabrication of Chromium Grating in Self-Traceable Interferometer

Influences of Misalignment Errors of Optical Components in an Orthogonal Two-Axis Lloyd's Mirror Interferometer.

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

A Mechanical Mosaic Method for Two-Dimensional Planar Grating Based on Diffracted Beams Orientation

Optimization of Longitudinal Alignment of an 4<i>f</i> System in a Compact Vectorial Optical-Field Generator Based on a High-Resolution Liquid Crystal Spatial Light Modulator

Optical Mosaic Method for Orthogonally Crossed Gratings by Utilizing Information about Both Main Periodic Directions Simultaneously

Method to Mosaic Gratings That Relies on Analysis of Far-Field Intensity Patterns in Two Wavelengths

Method of Making Mosaic Gratings by Using a Two-Color Heterodyne Interferometer Containing a Reference Grating.

Global Alignment Reference Strategy for Laser Interference Lithography Pattern Arrays

Method to Fabricate Orthogonal Crossed Gratings by an Interference Fringe Based Alignment Technique

Method for Fabricating Large-Area Gratings with a Uniform Duty Cycle Without a Spatial Beam Modulator

Analysis and Removal of Five-Dimensional Mosaicking Errors in Mosaic Grating

Patterning Nanoscale Crossed Grating with High Uniformity by Using Two-Axis Lloyd's Mirrors Based Interference Lithography.