Abstract:The fabrication of large-area and flexible nanostructures currently presents various challenges related to the special requirements for 3D multilayer nanostructures, ultrasmall nanogaps, and size-controlled nanomeshes. To overcome these rigorous challenges, a simple method for fabricating wafer-scale, ultrasmall nanogaps on a flexible substrate using a temperature above the glass transition temperature (<i>T</i>g) of the substrate and by layer-by-layer nanoimprinting is proposed here. The size of the nanogaps can be easily controlled by adjusting the pressure, heating time, and heating temperature. In addition, 3D multilayer nanostructures and nanocomposites with 2, 3, 5, 7, and 20 layers were fabricated using this method. The fabricated nanogaps with sizes ranging from approximately 1 to 40 nm were observed via high-resolution transmission electron microscopy (HRTEM). The multilayered nanostructures were evaluated using focused ion beam (FIB) technology. Compared with conventional methods, our method could not only easily control the size of the nanogaps on the flexible large-area substrate but could also achieve fast, simple, and cost-effective fabrication of 3D multilayer nanostructures and nanocomposites without any post-treatment. Moreover, a transparent electrode and nanoheater were fabricated and evaluated. Finally, surface-enhanced Raman scattering substrates with different nanogaps were evaluated using rhodamine 6G. In conclusion, it is believed that the proposed method can solve the problems related to the high requirements of nanofabrication and can be applied in the detection of small molecules and for manufacturing flexible electronics and soft actuators.

Fabrication of Nanoimprint Mold by Multilayer Film Deposition Technique

20-Nm Linewidth Nanoimprint Mold Prepared by Selectively Etched Multiplayer Thin Film

Fabrication of 2D silicon nano-mold by side etch lift-off method

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Optimal conditions for controllable one-dimensional nanomold by selective etching of multilayer film

Scanning probe lithography for nanoimprinting mould fabrication

Fabrication of Flexible Mold for Hybrid Nanoimprint-Soft Lithography

Nanoimprint lithography technology

Fabrication of sub-50 nm nanochannel array by an angle forming lift-off method

Single digit nanofabrication by step-and-repeat nanoimprint lithography

Cross-Linked Polymer Replica of A Nanoimprint Mold at 30 Nm Half-Pitch

Hybrid nanoimprint-soft lithography with sub-15 nm resolution.

A Sandwiched Flexible Polymer Mold for Control of Particle-Induced Defects in Nanoimprint Lithography

Fabrication of Nanostructures on a Large-Area Substrate with a Minimized Stitch Error Using the Step-and-Repeat Nanoimprint Process

Fabrication of 5 Nm Linewidth and 14 Nm Pitch Features by Nanoimprint Lithography

Imprint Lithography with 25-Nanometer Resolution

Integrated fabrication of micro/nano-fluidic chip based on nano-imprint lithography and bonding

Fabrication System for Large-Area Seamless Nanopatterned Cylinder Mold Using the Spiral Laser Interference Exposure Method

NANOIMPRINT TECHNOLOGY : RECENT PROGRESS AND APPLICATIONS

Bi-Layer Nanoimprinting Lithography for Metal-Assisted Chemical Etching with Application on Silicon Mold Replication

Large-Area Nanogap-Controlled 3D Nanoarchitectures Fabricated via Layer-by-Layer Nanoimprint