Cross-Linked Polymer Replica of A Nanoimprint Mold at 30 Nm Half-Pitch

HX Ge,W Wu,ZY Li,GY Jung,D Olynick,YF Chen,JA Liddle,SY Wang,RS Williams
DOI: https://doi.org/10.1021/nl048618k
IF: 10.8
2004-01-01
Nano Letters
Abstract:This letter reports the demonstration of a photocurable polymer process for replicating the master mold for nanoimprint lithography. The cross-linked polymer mold was fabricated directly with high fidelity from a master by imprinting and photocuring a low viscosity liquid prepolymer film spun onto a substrate. The surface of the cross-linked polymer mold can be treated using an O-2 Plasma, and then vapor primed with a low surface energy mold release layer for repeatable imprinting. The imprinting results demonstrated that the cross-linked polymer mold could be faithfully used for both thermal and photocurable nanoimprint lithography.
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