Abstract:Functional polyhedral oligomeric silsesquioxane (POSS)-based materials have been developed as an ideal material with high performance for nanoimprint lithography (NIL). A novel fluorinated hybrid resist as a soft mold for NIL, based on thiol-ene photopolymerization, was precisely designed and synthesized and is comprised of fluorinated mercaptopropyl polyhedral oligomeric silsesquioxane (POSS-F-SH) and a diluted crosslinker (2,2,3,3,4,4,5,5-octafluoro-1,6-hexyl diacrylate, DCFA(4)). The obtained fluorinated hybrid resists possess a variety of characteristics desirable for UV-NIL, including low viscosity (16-239 cP), a low bulk volumetric shrinkage (4.8-7.5%) and a good resistance to oxygen inhibition. The cross-linked hybrid resins exhibited high transparency to UV light and resistance to organic solvents. As a soft mold, the excellent mechanical property (Young's modulus: 0.31-1.56 GPa) and low surface energy (14-20.4 mJ m(-2)) of the fluorinated polymers provide a clean mold release without fracture or deformation of the embossed structures. The thermally stability (T-d > 300 degrees C) render them capable of being used for both UV and thermal NIL duplication processes. The resultant soft mold exhibited a high resolution patterning capacity with feature sizes in the range of 200 nm to several microns. The economic efficiency of the mold fabrication, as well as the high durability and excellent releasing properties, could be quite valuable in NIL for the high-throughput fabrication of nano-devices.

20-Nm Linewidth Nanoimprint Mold Prepared by Selectively Etched Multiplayer Thin Film

Fabrication of Nanoimprint Mold by Multilayer Film Deposition Technique

Optimal conditions for controllable one-dimensional nanomold by selective etching of multilayer film

Fabrication of 2D silicon nano-mold by side etch lift-off method

A Novel Pmma/Neb Bilayer Process for Sub-20 Nm Gold Nanoslits by A Selective Electron Beam Lithography and Dry Etch

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Scanning probe lithography for nanoimprinting mould fabrication

A Sandwiched Flexible Polymer Mold for Control of Particle-Induced Defects in Nanoimprint Lithography

Mold cleaning with polydimethylsiloxane for nanoimprint lithography.

Imprint Lithography with 25-Nanometer Resolution

Fabrication of sub-50 nm nanochannel array by an angle forming lift-off method

Hybrid nanoimprint-soft lithography with sub-15 nm resolution.

Cross-Linked Polymer Replica of A Nanoimprint Mold at 30 Nm Half-Pitch

Bi-Layer Nanoimprinting Lithography for Metal-Assisted Chemical Etching with Application on Silicon Mold Replication

Fabrication of Flexible Mold for Hybrid Nanoimprint-Soft Lithography

Fabrication of 5 Nm Linewidth and 14 Nm Pitch Features by Nanoimprint Lithography

Fast Patterning and Dry-Etch of SiNxfor High Resolution Nanoimprint Templates

Flexible nanoimprint lithography enables high-throughput manufacturing of bioinspired microstructures on warped substrates for efficient III-nitride optoelectronic devices

Realization of Silicon Nitride Template for Nanoimprint: A First Result

A "thiol-ene" photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL)

Alignment for imprint lithography using nDSE and shallow molds