Abstract:III-nitride materials are of great importance in the development of modern optoelectronics, but they have been limited over years by low light utilization rate and high dislocation densities in heteroepitaxial films grown on foreign substrate with limited refractive index contrast and large lattice mismatches. Here, we demonstrate a paradigm of high-throughput manufacturing bioinspired microstructures on warped substrates by flexible nanoimprint lithography for promoting the light extraction capability. We design a flexible nanoimprinting mold of copolymer and a two-step etching process that enable high-efficiency fabrication of nanoimprinted compound-eye-like Al2O3 microstructure (NCAM) and nanoimprinted compound-eye-like SiO2 microstructure (NCSM) template, achieving a 6.4-fold increase in throughput and 25% savings in economic costs over stepper projection lithography. Compared to NCAM template, we find that the NCSM template can not only improve the light extraction capability, but also modulate the morphology of AlN nucleation layer and reduce the formation of misoriented GaN grains on the inclined sidewall of microstructures, which suppresses the dislocations generated during coalescence, resulting in 40% reduction in dislocation density. This study provides a low-cost, high-quality, and high-throughput solution for manufacturing microstructures on warped surfaces of III-nitride optoelectronic devices.

Realization of Silicon Nitride Template for Nanoimprint: A First Result

Dip-In Photoresist for Photoinhibited Two-Photon Lithography to Realize High-Precision Direct Laser Writing on Wafer.

Fast Patterning and Dry-Etch of SiNxfor High Resolution Nanoimprint Templates

Fabrication of 2D silicon nano-mold by side etch lift-off method

Scanning probe lithography for nanoimprinting mould fabrication

Fabrication of sub-50 nm nanochannel array by an angle forming lift-off method

Silicon Nano-Wire Fabricated by Boe Silicon Etching

Flexible nanoimprint lithography enables high-throughput manufacturing of bioinspired microstructures on warped substrates for efficient III-nitride optoelectronic devices

Bi-Layer Nanoimprinting Lithography for Metal-Assisted Chemical Etching with Application on Silicon Mold Replication

Fabrication of Nanoporous Silicon Dioxide/silicon Nitride Membranes Using Etched Ion Track Technique

Fabrication of in Situ Ultrathin Anodic Aluminum Oxide Layers for Nanostructuring on Silicon Substrate

Nanofabrication of Sic Templates for Direct Hot Embossing for Metallic Photonic Structures and Meta Materials

20-Nm Linewidth Nanoimprint Mold Prepared by Selectively Etched Multiplayer Thin Film

Large Area Nanoscale Patterning of Functional Materials Using Organosilicate ink based Nanotransfer Printing

Fabrication of Nanoimprint Mold by Multilayer Film Deposition Technique

Single digit nanofabrication by step-and-repeat nanoimprint lithography

Fabrication of nanoscale stencils through focused ion beam milling and dry transfer of silicon-on-nothing membrane with perforations

A facile nanowire fabrication approach based on edge lithography

UV-assisted nanoimprint lithography: the impact of the loading effect in silicon on nanoscale patterns of metalens

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Fabrication of 150 Nm Half-Pitch Grating Templates for Nanoimprint Lithography