Single digit nanofabrication by step-and-repeat nanoimprint lithography

C Peroz,S Dhuey,M Cornet,M Vogler,D Olynick,S Cabrini

DOI: https://doi.org/10.1088/0957-4484/23/1/015305

IF: 3.5

2011-12-08

Nanotechnology

Abstract:A novel strategy for fabricating nanoimprint templates with sub-10 nm patterns is demonstrated by combining electron beam lithography and atomic layer deposition. Nanostructures are replicated by step-and-repeat nanoimprint lithography and successfully transferred into functional material with high fidelity. The process extends the capacity of step-and-repeat nanoimprint lithography as a single digit nanofabrication method. Using the ALD process for feature shrinkage, we identify a size dependent deposition rate.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology