All-Water Etching-Free Electron Beam Lithography for On-Chip Nanomaterials
Xiaohan Wang,Xiao Dai,Hao Wang,Jiong Wang,Qi Chen,Fengnan Chen,Qinghua Yi,Rujun Tang,Liang Gao,Liang Ma,Chen Wang,Xiangyi Wang,Guanglong He,Yue Fei,Yanqiu Guan,Biao Zhang,Yue Dai,Xuecou Tu,Lijian Zhang,Labao Zhang,Guifu Zou
DOI: https://doi.org/10.1021/acsnano.2c12387
IF: 17.1
2023-01-01
ACS Nano
Abstract:Electron beam lithography uses an accelerated electron beam to fabricate patterning on an electron-beam-sensitive resist but requires complex dry etching or lift-off processes to transfer the pattern to the substrate or film on the substrate. In this study, etching-free electron beam lithography is developed to directly write a pattern of various materials in all-water processes, achieving the desired semiconductor nanopatterns on a silicon wafer. Introduced sugars are copolymerized with metal ions-coordinated polyethylenimine under the action of electron beams. The all-water process and thermal treatment result in nanomaterials with satisfactory electronic properties, indicating that diverse on-chip semiconductors (e.g., metal oxides, sulfides, and nitrides) can be directly printed on-chip by an aqueous solution system. As a demonstration, zinc oxide patterns can be achieved with a line width of 18 nm and a mobility of 3.94 cm2 V-1 s-1. This etching-free electron beam lithography strategy provides an efficient alternative for micro/nanofabrication and chip manufacturing.