Nanoimprint lithography technology

陈献忠,姚汉民,陈旭南,李展,石建平
DOI: https://doi.org/10.3321/j.issn:1671-4512.2004.12.021
2002-01-01
Abstract:This paper presented a method for manufacturing nano-structure by nanoimprint lithography. It created features by the mechanical deformation of resist shape using a mold rather than by changing chemical properties of the resist. The lithography resolution was not limited by wavelength, numerical aperture and so on. Nanoimprint lithography was characterized by high efficiency, low cost and high aspect ratio. The process steps of nanoimprint lithography and the machine developed by us were presented. Some experimental examples on fabricating micro/nano structures and devices were given, such as nano-gratings, micro-hole arrays, micro-lens arrays and micro-fluidics channels.
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