Abstract:Traditional laser lithography systems cannot write sub-wavelength patterns due to the diffraction limit. In this paper, a novel super-resolution laser direct writing method is proposed to break through the diffraction limit. Compared with conventional lithography systems, the photoresist layer in this method is overlaid by an extra photochromic layer which is a mixture of metanil yellow and aqueous PVA solution. Then a vortex beam with a hollow energy distribution is used to expose the photochromic layer and make an annular region of the photochromic layer opaque to the writing beam. Thus, a virtual aperture is formed in the photochromic layer which can confine the diameter of the writing beam and reduce the linewidth exposed in the photoresist layer. Lithography process of this new method was modeled and a corresponding simulation was made. In this simulation, the intensity ratio of the two beams, relative absorption coefficients and other parameters were changed to study their influence to linewidth in the photoresist. An experimental setup was designed to validate the simulation, where the wavelengths of the writing beam and the vortex beam are 405 nm and 532 nm, respectively. These two beams are strictly coaxial when they are incident to the photochromic layer. The experimental results agree quite well with the model simulation, showing that the linewidth could be reduced by increasing the intensity ratio of the vortex beam to the writing beam. They also indicate that the vortex beam could effectively reduce the lithography linewidth to 300nm or even smaller.

Photolithography Using Lateral Surface of Nanofibers

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Sub-diffraction Optical Beam Lithography Based on a Center-Non-zero Depletion Laser

Subwavelength-resolution Direct Writing Using Submicron-Diameter Fibers

Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

High-resolution 3D Nanoprinting Based on Two-Step Absorption Via an Integrated Fiber-Coupled Laser Diode.

Laser Direct Writing Using Submicron-Diameter Fibers.

Light and Matter Co-Confined Multi-Photon Lithography

Optical Vortex Beam Direct-Writing Photolithography

Beyond 100 nm Resolution in 3D Laser Lithography: Post Processing Solutions

High Throughput Laser Nano Direct Writing Technique

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Direct Laser Writing Breaking Diffraction Barrier Based on Two-Focus Parallel Peripheral-Photoinhibition Lithography

Solvent-Free Nanofabrication Based on Ice-Assisted Electron-Beam Lithography.

Surface-plasmon-assisted nanoscale photolithography by polarized light

Hybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 Nm Resolution

Beam Pen Lithography.

Hyper-lithography

The Steady Flying Of A Plasmonic Flying Head Over A Photoresist-Coated Surface In A Near-Field Photolithography System

High-resolution Laser Lithography Based on Vortex Laser and Composite Layer

Fresnel diffraction lithography