Abstract:Rotary near-field lithography（RNFL） technology provides a route to overcome the diffraction limit with a high throughput and low cost for nanomanufacturing. Utilizing the advantage of the passive flying of a plasmonic head, RNFL can achieve a 10 m/s processing speed with a perfect near-field condition at dozens of nanometers. The flying performance of the plasmonic flying head（PFH） is the pivotal issue in the system. The linewidth has a strong correlation with the near-field gap, and the manufacturing uniformity is directly influenced by the dynamic performance. A more serious issue is that the unexpected contact between the PFH and substrate will result in system failure. Therefore, it is important to model and analyze the flying process of the PFH at the system level. In this study, a novel full-coupled suspension-PFH-air-substrate（SPAS） model that integrates a six-degree of freedom suspension-PFH dynamics, PFH-air-substrate air bearing lubrication, and substrate vibration, is established. The pressure distribution of the air bearing is governed by the molecular gas lubrication equation that is solved by the finite element method（FEM） with a local pressure gradient based adaptive mesh refinement algorithm using the COMSOL Multiphysics software. Based on this model, three designs of the air bearing surface are chosen to study the static, dynamic, and load/unload performance to verify whether it satisfies the design requirements of RNFL. Finally, a PFH analysis solver SKLY.app is developed based on the proposed model.

The Steady Flying Of A Plasmonic Flying Head Over A Photoresist-Coated Surface In A Near-Field Photolithography System

Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

Dip-In Photoresist for Photoinhibited Two-Photon Lithography to Realize High-Precision Direct Laser Writing on Wafer.

Photolithography Using Lateral Surface of Nanofibers

Click chemistry assisted organic-inorganic hybrid photoresist for ultra-fast two-photon lithography

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

Optical Vortex Beam Direct-Writing Photolithography

248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

High-speed Near-Field Photolithography at 1685 Nm Linewidth with Linearly Polarized Illumination

Plasmonic Direct-Writing Lithography Via High Numerical Aperture Objectives.

A Large-Area Photolithography Technique Based on Surface Plasmons Leakage Modes

Numerical Modeling and Analysis of Plasmonic Flying Head for Rotary Near-Field Lithography Technology

Forty-Nanometer Plasmonic Lithography Resolution with Two-Stage Bowtie Lens

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Surface-plasmon-assisted nanoscale photolithography by polarized light

Focused Ion Beam Assisted Interface Detection for Fabricating Functional Plasmonic Nanostructures

Two-Surface-Plasmon-Polariton-Absorption Based Nanolithography

High Resolution Photolithography with Sub-Wavelength Grating

Study on Photoresist Transfer in Rotational Near-Field Photolithography Using Molecular Dynamics Simulation

Imaging Analysis of Nanolithography Based on Surface-Plasmon Polariton