Abstract:We demonstrate that photolithography can be extended to a subwavelength resolution for patterning of virtually any substrate by exciting surface plasmons on both a metallic mask and a substrate. Without any additional equipment or added complexity to mask design, one-to-one pattern transfer has been achieved. In this letter, a polarized laser beam of 355 nm wavelength was used as light source to photoinitiate an 80 nm thick photoresist on a silicon substrate coated with titanium of 80 nm thick. Array of line apertures of 100 nm in width were made on gold film or titanium film deposited on a quartz substrate, serving as the mask. Simulation results by finite-difference time-domain method have shown that surface plasmons excited on both the metallic mask and the Ti shield help to spatially confine the light behind the apertures. Experimental results show a strong dependence of pattern transfer on the polarization of light as well as the energy dosage of the light. The feature size using such method could be further scaled down, limited theoretically by the validity of the dielectric function of the material, and practically by the fabrication of the mask.

Two-Surface-Plasmon-Polariton-Absorption Based Nanolithography

Highly Sensitive Cationic Photoresist for High-Throughput Two-Photon Nanofabrication

Two-Surface-Plasmon-Polariton-Absorption Based Lithography Using 400 Nm Femtosecond Laser

Nano-patterning based on two-surface-plasmon-polariton-absorption using 400nm femtosecond laser

Photolithography Using Lateral Surface of Nanofibers

Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth.

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Subwavelength Nanolithography Based on Unidirectional Excitation of Surface Plasmons

A Large-Area Photolithography Technique Based on Surface Plasmons Leakage Modes

Large-area surface-plasmon polariton interference lithography.

Nanostructure Photolithography Based On Surface Plasmonic Interference

Surface Plasmon Interference Nanolithography

Subwavelength Patterning Based On A Surface Plasmon Resonant Cavity

Plasmonic Nanolithography: A Review

Maskless Plasmonic Lithography at 22 Nm Resolution.

Surface-plasmon-assisted nanoscale photolithography by polarized light

Sub-100 Nm Lithography Using Ultrashort Wavelength of Surface Plasmons

248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

Forty-Nanometer Plasmonic Lithography Resolution with Two-Stage Bowtie Lens

A Practical Nanofabrication Method: Surface Plasmon Polaritons Interference Lithography Based on Backside-Exposure Technique

Surface-plasmon Polariton Interference Nanolithography Based on End-Fire Coupling