Abstract:The near-field photolithography technique (NFPT) offers a new approach of nanolithography for a dramatic increase in the resolution with high throughput and low cost. The NFPT utilizes the same flight principle as that of the magnetic head of hard-disk drives but replacing the magnetic head with a plasmonic flying head. The plasmonic flying head, which can focus the incident laser beam to a spot size of sub-20 nm with an enhanced field intensity by exciting surface plasmon polaritons, takes off and then flies steadily above the revolving disk coated by a photoresist film to be patterned with a narrow gap of tens of nanometers. As a key foundation of the NFPT, the take off and flight stability of the plasmonic flying head affects the pattern density and the fabrication efficiency. This work proposed and investigated a molecular glass photoresist, named FPT-8Boc, for the large-scale consistent fabrication with the NFPT. To overcome the take-off problem of the head over the soft photoresist film, a transition zone is intentionally formed by washing off the coated photoresist in the outer area of the disk using a solvent. The simulation results by COMSOL Multiphysics software and quasi-Newton iteration method review that the matched transition zone height with spreading length can guarantee the flight stability of the plasmonic flying head on the soft photoresist. Using this method, a preliminary photolithography result with a 31 nm line width has been achieved.

High-speed Near-Field Photolithography at 1685 Nm Linewidth with Linearly Polarized Illumination

Sub-diffraction Optical Beam Lithography Based on a Center-Non-zero Depletion Laser

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Click chemistry assisted organic-inorganic hybrid photoresist for ultra-fast two-photon lithography

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Photolithography Using Lateral Surface of Nanofibers

Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Surface-plasmon-assisted nanoscale photolithography by polarized light

The Steady Flying Of A Plasmonic Flying Head Over A Photoresist-Coated Surface In A Near-Field Photolithography System

Near-field Switching and Focusing Using Plasmonic Nanostructures with Different Polarizations

Nanofocusing by Phase Delayed Plasmonic Nanostructures Illuminated with A Linearly Polarized Light

Forty-Nanometer Plasmonic Lithography Resolution with Two-Stage Bowtie Lens

Optimization Design and Fabrication of Plasmonic Lens for Near-Field Lithography

Two-Surface-Plasmon-Polariton-Absorption Based Nanolithography

Two-Surface-Plasmon-Polariton-Absorption Based Lithography Using 400 Nm Femtosecond Laser

Realize the Concentric Circles Pattern Based on Two-Surface-Plasmon-Polariton Absorption Photolithography

Direct Laser Writing Breaking Diffraction Barrier Based on Two-Focus Parallel Peripheral-Photoinhibition Lithography

Toward Practical, Subwavelength, Visible-Light Photolithography with Hyperlens.