Abstract:Channel fabrication technology has become increasingly important for microfluidic and nanofluidic devices. In particular, glass channels have high chemical and physical stability, high optical transparency, and ease of surface modification, so that there is increasing interest in glass microfluidic devices for chemical experiments in microfluidics and nanofluidics. For the fabrication of glass channels, especially those with a high aspect ratio (depth/width), lithography using a metal resist and dry etching have mainly been used. However, there are still issues involving the surface roughness of the etched channel and the low etching selectivity. In this study, a microchannel fabrication method with high etching selectivity that produces a smooth etched surface was developed. First, interference during dry etching by remaining Cr particles after the photolithography and Cr etching processes was assumed as the cause of the rough etched surface. Three different dry etching processes were introduced to verify this. In process 1 without removal of the Cr particles, the etched surface was not flat and had a 1 μm scale roughness. In process 2 where a cleaning process was included and high power etching was conducted, a smooth surface with a 1 nm scale roughness and a faster etching rate of 0.3 μm/min were obtained. For this high-power etching condition, the etching selectivity (fused silica/Cr) was relatively low at approximately 39-43. In process 3 with a cleaning process and low-power etching, although the etching rate was relatively low at 0.1 μm/min, a smooth surface with 1 nm scale roughness (10 nm scale roughness deeper than 40 μm in the depth region) and a much higher etching selectivity of approximately 79-84 were obtained. The dry etching method presented in this study represents a significant contribution to microfluidics/nanofluidics for microchannel/nanochannel fabrication.

Fabrication of Optofluidic Systems Using Isotropic Wet Etched Masters in < 111 > Silicon Wafer

Simple and Cost-Effective Fabrication of Two-Dimensional Plastic Nanochannels from Silica Nanowire Templates

Design and fabrication of a nanofluidic channel by selective thermal oxidation and etching back of silicon dioxide made on a silicon substrate

Fabrication of the microfluidic channels in silicon wafers using isotropic wet etching method: the impact of the composition of HNA solution on etching

Micro Etching Method Inside Microchannels

Flow-restricted Etching Method on Isotropic Substrates and Its Mechanism

Fabrication Of Microfluidic Chips By An Ultrasonic Micromachining With Wet-Etch Smoothing Method On Glass Substrates

Fused silica microchannel fabrication with smooth surface and high etching selectivity

A Low-Cost Fabrication System for Manufacturing Soft-Lithography Microfluidic Master Molds

Fabrication of High-Aspect-ratio Grooves in Silicon Using Femtosecond Laser Irradiation and Oxygen-Dependent Acid Etching.

Fabricating A Variety Of Micro-Optics Structures Using Anisotropic Etching Of Silicon

Fabrication of 2D silicon nano-mold by side etch lift-off method

Fabrication of 1D nanofluidic channels on glass substrate by wet etching and room-temperature bonding

Direct Fabrication of Homogeneous Microfluidic Channels Embedded in Fused Silica Using a Femtosecond Laser

Formation of ultralow-reflectance silicon surface by dry etching

Fabrication of fluidic submicron-channels by pulsed laser-induced buckling of SiOx films on fused silica

Fabrication Of Microfluidic Devices In Silica Glass By Water-Assisted Ablation With Femtosecond Laser Pulses

Glass etching to bridge micro- and nanofluidics.

Method for Fabricating Micro/Nanostructures Via Scanning Probe Microscope and Anisotropic Wet Etching

Manufacture of Three-Dimensional Optofluidic Spot-Size Converters in Fused Silica Using Hybrid Laser Microfabrication

Fabrication of Poly(dimethylsiloxane) Microfluidic System Based on Masters Directly Printed with an Office Laser Printer.