Fabrication of Ultrafine Nanostructures

ZHANG Jing-min,LIAO Zhi-min,YOU Li-ping,YE Heng-qiang,YU Da-peng
DOI: https://doi.org/10.3969/j.issn.1000-6281.2007.03.001
2007-01-01
Abstract:Ultrafine nanostructures(feature size 5 nm) have been successfully fabricated with single-nanometre precision using the strong irradiation damage effect of convergent electron beam in a 300 kV high-resolution transmission electron microscope.This approach can be widely applied to inorganic solid-state materials from insulators,semiconductors to metals.The feature size can be precisely controlled by the probe size and the irradiation time.Our approach is promising in design and fabrication of ultrafine nanostructures and nanodevices.
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