Electrochemical study and structural comparison of Ni electrodepositions on W/Si and Cr/C multilayered structure films
Chen Haixiang,Kun Wang,Xue yuntian,Zhanshan Wang
DOI: https://doi.org/10.1088/1361-6463/ad4cfd
2024-05-19
Journal of Physics D Applied Physics
Abstract:The Ni electrodeposition combined with multilayered structure film is a promising strategy in modern optical manufacturing, while less effort has been devoted to comprehending the electrochemical reaction process, which is essential for their practical applications. In view of this, the initial reduction dynamics and nucleation mechanisms of Ni electrodepositions on multilayer W/Si and Cr/C films were analyzed in this work, and the morphological, crystal, and mechanical characteristics of produced Ni electrodeposits were further determined and compared. The results show that the considerably irregular crystals accompanied by high tensile stress of 119.5 MPa were formed for the Ni electrodeposit on W/Si film, which were mainly attributed to the progressive nucleation process with more severe side reaction of hydrogen evolution. By contrast, the instantaneous nucleation mode with lower reduction resistance were revealed for the Ni electrodeposition on Cr/C film, which presented a comparatively fine–grained texture, less roughness, and smaller stress structure. To summarize, the more stable electrochemical reaction process and improved structure uniformity are obtained for the Ni electrodeposition on metal/C–based film, which offers a theoretical guidance for optimized fabrication of multilayer optical devices in extreme ultraviolet, X–ray, and neutron focusing fields.
physics, applied