Method for preparing surface conduction electron emitting film in Zr-Si-N nano double-phase structure

Chunliang Liu,Luping Liu,Lingzhi Ma,Yanhui Shi,Zhongxiao Song,Huiyan Wu,Shengli Wu,Kewei Xu,Qingwen Yue
2010-01-01
Abstract:The invention relates to a surface- conduction electron emitting film material, and discloses a method for preparing a surface conduction electron emitting film with a Zr-Si-N nano double-phase structure. The method comprises the following steps of: simultaneously carrying out reactive magnetic-control sputtering on a Zr target and a Si target by using glass as a basal body in an N2/Ar mixed air atmosphere, and precipitating to generate the surface conduction electron emitting film in the Zr-Si-N nano double-phase structure with a ZrNX conducting phase and a SiNX insulating phase.
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