Microstructures and mechanical properties of Zr-Si-N films prepared by reactive sputtering

Yan Liu,YunShan Dong,JiaZhen Huang,LiZhong Zhang,Geyang Li

2006-01-01

Abstract:A series of Zr-Si-N composite films with different Si contents were grown in an atmosphere of Ar and N2 mixture by reactive magnetron sputtering of a bi-target. The films were characterized with energy dispersive spectroscopy (EDS), X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and nano-indentation. The results show that Si contents significantly affect its mechanical properties. Addition of Si results in formation of Si3N4 on ZrN grain surfaces, which prevents the grains from growing. As Si content decreases, the strength of the Zr-Si-N films increases. For instance, with a Si content of 6.2at%, both its hardness and its elastic module reach the maxima, 29.8 GPa and 352 GPa, respectively, possibly because of small size of the ZrN grains and of existence Si3N4 at the interfaces. While Si contents increases higher than 6.2at%, crystalline Zr-Si-N composite films turn into amorphous films with decreasing mechanical properties possibly because of the low wettability of ZrxSiy at the ZrN grain interfaces.