Method for controlling phase structures of metallic nano Cu/Ru multilayer film

Wang Fei,Zhou Qing,Huang Ping,Xu Kewei
2015-01-01
Abstract:The invention discloses a method for controlling phase structures of a metallic nano Cu/Ru multilayer film. The method is characterized in that the phase structures of the multilayer film gradually transit from fcc/hcp to fcc/fcc along with change of the thickness of copper layers and ruthenium layers and finally evolve to hcp/hcp by adopting a slow rate deposition process, controlling the single layer thickness of the copper layers and ruthenium layers and adjusting the parameters in the sputtering process, such as rotating speed and bias voltage in the magnetron sputtering coating process. A film prepared by the method has a compact structure and clear interface layers, and the components of each layer and interface structures can be easily controlled by controlling the film thickness of different layers, thus providing possibility for preparing single-phase nanocrystalline materials with controllable mechanical properties. Meanwhile, the method is simple to operate, is lower in cost and is easy to implement and popularize industrially.
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